Patents Assigned to Micro Resist Technology GmbH
  • Light-sensitive resist which can be developed in an aqueous-alkali manner and operates negatively
    Patent number: 6398640
    Abstract: The invention relates top a light sensitive, aqueous alkali developing, negatively acting resist, comprising a phenolic resin as a binder, and a diazostilbene disulfonic acid ester light sensitive component, a solvent or mixture of solvents, and film forming and/or film stabilizing additives, and to a process for preparing the light sensitive component.
    Type: Grant
    Filed: October 18, 1999
    Date of Patent: June 4, 2002
    Assignee: Micro Resist Technology GmbH
    Inventors: Gabi Grützner, Anja Voigt, Jürgen Bendig, Ines Schmidt, Erika Sauer