Patents Assigned to MicroCoating Technologies
  • Patent number: 6212078
    Abstract: Nanolaminates are formed by alternating deposition, e.g., by combustion chemical vapor deposition (CCVD), layers of resistive material and layers of dielectric material. Outer resistive material layers are patterned to form discrete patches of resistive material. Electrical pathways between opposed patches of resistive material on opposite sides of the laminate act as capacitors. Electrical pathways horizontally through resistive material layers, which may be connected by via plated holes, act as resistors.
    Type: Grant
    Filed: October 27, 1999
    Date of Patent: April 3, 2001
    Assignee: MicroCoating Technologies
    Inventors: Andrew T. Hunt, Wen-Yi Lin, Richard W. Carpenter
  • Patent number: 6207522
    Abstract: Thin layer capacitors are formed from a first flexible metal layer, a dielectric layer between about 0.03 and about 2 microns deposited thereon, and a second flexible metal layer deposited on the dielectric layer. The first flexible metal layer may either be a metal foil, such as a copper, aluminum, or nickel foil, or a metal layer deposited on a polymeric support sheet. Depositions of the layers is by or is facilitate by combustion chemical vapor deposition or controlled atmosphere chemical vapor deposition.
    Type: Grant
    Filed: November 23, 1998
    Date of Patent: March 27, 2001
    Assignee: MicroCoating Technologies
    Inventors: Andrew T. Hunt, Tzyy Jiuan Hwang, Helmut G. Hornis, Wen-Yi Lin
  • Patent number: 6132653
    Abstract: A method for chemical vapor deposition using a very fine atomization or vaporization of a reagent containing liquid or liquid-like fluid near its supercritical temperature, where the resulting atomized or vaporized solution is entered into a flame or a plasma torch, and a powder is formed or a coating is deposited onto a substrate. The combustion flame can be stable from 10 torr to multiple atmospheres, and provides the energetic environment in which the reagent contained within the fluid can be reacted to form the desired powder or coating material on a substrate. The plasma torch likewise produces the required energy environment, but, unlike the flame, no oxidizer is needed so materials stable in only very low oxygen partial pressures can be formed.
    Type: Grant
    Filed: April 16, 1999
    Date of Patent: October 17, 2000
    Assignee: Microcoating Technologies
    Inventors: Andrew T. Hunt, Helmut G. Hornis
  • Patent number: 5997956
    Abstract: A method for chemical vapor deposition using a very fine atomization or vaporization of a reagent containing liquid or liquid-like fluid near its supercritical temperature, where the resulting atomized or vaporized solution is entered into a flame or a plasma torch, and a powder is formed or a coating is deposited onto a substrate. The combustion flame can be stable from 10 torr to multiple atmospheres, and provides the energetic environment in which the reagent contained within the fluid can be reacted to form the desired powder or coating material on a substrate. The plasma torch likewise produces the required energy environment, but, unlike the flame, no oxidizer is needed so materials stable in only very low oxygen partial pressures can be formed.
    Type: Grant
    Filed: August 2, 1996
    Date of Patent: December 7, 1999
    Assignee: Microcoating Technologies
    Inventors: Andrew T. Hunt, Helmut G. Hornis