Patents Assigned to Microelectronics and Computer Technology
  • Patent number: 5551903
    Abstract: A field emission cathode is provided which includes a substrate and a conductive layer disposed adjacent the substrate. An electrically resistive pillar is disposed adjacent the conductive layer, the resistive pillar having a substantially flat surface spaced from and substantially parallel to the substrate. A layer of diamond is disposed adjacent the flat surface of the resistive pillar.
    Type: Grant
    Filed: October 19, 1994
    Date of Patent: September 3, 1996
    Assignee: Microelectronics and Computer Technology
    Inventors: Nalin Kumar, Chenggang Xie
  • Patent number: 4991290
    Abstract: A method and apparatus for making a flexible interconnect for connection between stacks of electronic components. The method includes forming a plurality of holes through a flexible insulating material, depositiong electrically conductive metal studs into the holes extending out of at least one side and preferably both sides of the flexible material, and electrically interconnecting some of the electrically conductive metal studs by interconnects supported by the flexible material. The interconnects may be supported from the outside of the flexible material or embedded therein. Dummy studs may be provided in the flexible material extending to the outside and aligned with studs extending on the other side of the insulating material which are connected to the electrical interconnects.
    Type: Grant
    Filed: June 16, 1989
    Date of Patent: February 12, 1991
    Assignee: Microelectronics and Computer Technology
    Inventor: Colin A. MacKay
  • Patent number: 4983250
    Abstract: Forming an electrical interconnect by applying an adhesion layer over a substrate, applying an electrical conductor layer over the adhesion layer, and applying a reacting layer over the electrical conductor layer. A laser beam is directed over the reacting layer in a desired pattern to interdiffuse the reacting and conductor layers and form a reaction product. The reaction product is used as an etch mask for etching away the reacting layer, the conductor layer, and the adhesion layer outside of the reaction product.
    Type: Grant
    Filed: June 16, 1989
    Date of Patent: January 8, 1991
    Assignee: Microelectronics and Computer Technology
    Inventor: Ju-Don T. Pan