Patents Assigned to MICROGAUGE AG
  • Patent number: 10871414
    Abstract: The present invention relates to a MEMS deposition trap (10) comprising: a manifold layer having manifold inlet channels and manifold outlet channels, a microchannel layer (20) having microchannels (33), wherein the manifold layer and the microchannel layer are bonded together so as to form a fluid path, wherein a fluid is forced to pass through the microchannels (33) when flowing from the manifold inlet channels to the manifold outlet channels. Furthermore, it relates to a vacuum sensor having such a deposition trap as and to a process chamber of a manufacturing equipment, preferably used for thin-film deposition or etching processes, comprising such a vacuum sensor.
    Type: Grant
    Filed: June 24, 2016
    Date of Patent: December 22, 2020
    Assignee: MICROGAUGE AG
    Inventor: Nina Wojtas