Patents Assigned to Micron Technolyg, Inc.
  • Methods of forming titanium-containing materials
    Patent number: 7622388
    Abstract: The invention includes methods of forming titanium-containing materials, such as, for example, titanium silicide. The invention can use alternating cycles of titanium halide precursor and one or more reductants to form the titanium-containing material. For instance, the invention can utilize alternating cycles of titanium tetrachloride and activated hydrogen to form titanium silicide on a surface of a silicon-containing substrate.
    Type: Grant
    Filed: March 7, 2008
    Date of Patent: November 24, 2009
    Assignee: Micron Technolyg, Inc.
    Inventors: Jaydeb Goswami, Joel A. Drewes