Abstract: Heat is provided to substrates at a step of a process by providing identical movable heating devices, one for each substrate, placing each substrate onto one of the heating devices, sequentially moving each device into a position where the step of the process can be performed on the substrate, and causing each of the devices to provide heat to the substrate at each step of the process.

Abstract: Electron cyclotron resonance (ECR) is achieved in a source chamber of a size which is non-resonant with respect to propagation of the microwave power within the chamber. The microwaves are delivered into the chamber via a waveguide and window so that breakdown occurs initially only in a region in the vicinity of the window. A dielectric coupler between the waveguide and the window has a larger end and a smaller end and is filled with a dielectric material. The magnetic field generator for stimulation the electron resonance in the chamber includes a pair of conductive current carrying coils coaxial with each other and with an axis of the chamber, the coils being arranged in a Helmholtz configuration. The waveguide includes a microwave stub tuner for tuning the propagation and absorption of the microwave power in the plasma within the chamber to control the location and shape of the region in which the plasma is formed.