Abstract: Embodiments of the invention relate to a stage leveling device for a high-performance mask aligner, having enhanced leveling maintenance and, in particular, a novel technology of preventing leveling misalignment by firmly fixing a leveling-completed wafer stage. The stage leveling device, according to an embodiment of the invention addresses the problems experienced by conventional leveling devices. According to at least one embodiment, when a locking ring inserted at an outer side of a leveling rod maintains an inclined state, locking is performed such that an inner circumferential surface of the locking ring fixes opposite sides of the leveling rod by applying pressure thereto and, when the locking ring maintains a horizontal state, unlocking is performed such that the inner circumferential surface of the locking ring is spaced apart from the leveling rod.

Abstract: There is provided a scan and step exposure system to enable to perform the exposure on a large-sized subject to be exposed such as a film and a wafer, which was difficult to perform circuit patterning process on at one time, by transferring an exposure module by step feed way or making it moved continuously like scanning way in such way that an exposure subject is adsorbed on a chuck tray drawn out of the system body and the chuck tray is put into the body and placed under a mask holder, and a glass base having a film mask having circuit patterns adsorbed thereon is mounted on the mask holder, and the distance between the glass base and the exposure subject is controlled while moving the mask holder up and down, and the exposure process is performed while moving the exposure module located above the mask holder in the transverse direction continuously by scan way or by step feed way.

Abstract: There is provided a scan and step exposure system to enable to perform the exposure on a large-sized subject to be exposed such as a film and a wafer, which was difficult to perform circuit patterning process on at one time, by transferring an exposure module by step feed way or making it moved continuously like scanning way in such way that an exposure subject is adsorbed on a chuck tray drawn out of the system body and the chuck tray is put into the body and placed under a mask holder, and a glass base having a film mask having circuit patterns adsorbed thereon is mounted on the mask holder, and the distance between the glass base and the exposure subject is controlled while moving the mask holder up and down, and the exposure process is performed while moving the exposure module located above the mask holder in the transverse direction continuously by scan way or by step feed way.