Patents Assigned to MIKRO MESA TECHNOLGY CO., LTD.
  • Patent number: 10158043
    Abstract: A method for manufacturing a light-emitting diode (LED) includes plural steps as follows. A first type semiconductor layer is formed. A second type semiconductor layer is formed on the first type semiconductor layer. An impurity is implanted into a first portion of the second type semiconductor layer. The concentration of the impurity present in the first portion of the second type semiconductor layer is greater than the concentration of the impurity present in a second portion of the second type semiconductor layer after the implanting, such that the resistivity of the first portion of the second type semiconductor layer is greater than the resistivity of the second portion of the second type semiconductor layer.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: December 18, 2018
    Assignee: MIKRO MESA TECHNOLGY CO., LTD.
    Inventors: Li-Yi Chen, Pei-Yu Chang, Hsin-Wei Lee, Chun-Yi Chang, Shih-Chyn Lin