Abstract: This disclosure provides systems, methods, and apparatus detecting defects in a substrate. An image of the substrate is compared with a reference image to identify potential defects. Images corresponding to the potential defects are processed sequentially by a set of classifiers to generate a set of images that include a defect. The set of classifiers can be arranged to have increasing accuracy. A subset of the images corresponding to the potential defects is processed by a type classifier that can determine the type, size, and location of the defect in the images. The defects can be further processed to determine the severity of the defects based on the location of the defects on the substrate.

Abstract: This disclosure provides systems, methods, and apparatus detecting defects in a substrate. An image of the substrate is compared with a reference image to identify potential defects. Images corresponding to the potential defects are processed sequentially by a set of classifiers to generate a set of images that include a defect. The set of classifiers can be arranged to have increasing accuracy. A subset of the images corresponding to the potential defects is processed by a type classifier that can determine the type, size, and location of the defect in the images. The defects can be further processed to determine the severity of the defects based on the location of the defects on the substrate.