Patents Assigned to Mitsubish Electric Corporation
  • Publication number: 20160254862
    Abstract: A wavelength multiplexing transmission system including an optical transmission and reception device including a plurality of transponders each having a plurality of optical transmitters and receivers, a BER monitoring device to monitor the BERs of the optical transmitters and receivers, variable optical attenuators to attenuate light signals outputted from the optical transmitters and receivers, a controller to control the amounts of attenuation of the variable optical attenuators such that the sum total of the BERs of the optical transmitters and receivers becomes small, and an optical multiplexing and demultiplexing device to multiplex the light signals attenuated into a light signal and transmit this light signal to outside the system, and demultiplex a light signal from outside the system into light signals and transmit these light signals to the optical transmitters and receivers.
    Type: Application
    Filed: November 20, 2014
    Publication date: September 1, 2016
    Applicant: MITSUBISH ELECTRIC CORPORATION
    Inventor: Shusaku HAYASHI
  • Patent number: 9355852
    Abstract: A method for manufacturing a semiconductor device includes: preparing a Si substrate having a flat portion with flat front and back surfaces and a bevel portion located at a periphery of the flat portion; forming a III-V nitride semiconductor film on the front surface of the Si substrate by epitaxial growth; and after forming the III-V nitride semiconductor film, grinding the Si substrate from the back surface. Amounts of working at the bevel portion on the front surface and the back surface of an outermost end portion of the bevel portion are asymmetrical. A first thickness measured from the front surface of the flat portion to the outermost end portion is smaller than a second thickness measured from the back surface of the flat portion to the outermost end portion.
    Type: Grant
    Filed: March 26, 2014
    Date of Patent: May 31, 2016
    Assignee: MITSUBISH ELECTRIC CORPORATION
    Inventor: Takahiro Yamamoto
  • Publication number: 20140302629
    Abstract: A manufacturing method includes a step of forming an impurity diffusion layer by diffusing an impurity element in a surface of a silicon-based substrate; and an etching step of removing the impurity diffusion layer in at least a portion of a first-surface side of the silicon-based substrate, wherein the etching step includes an etching-fluid supplying step of, on the first-surface side, supplying an etching fluid that flows to an outer edge portion of the silicon-based substrate from a supply position, and an air supplying step of, on a second-surface side, which is opposite to the first-surface side, of the silicon-based substrate, supplying air in a same direction as the etching fluid in accordance with supply of the etching fluid at the etching-fluid supplying step.
    Type: Application
    Filed: February 1, 2012
    Publication date: October 9, 2014
    Applicant: Mitsubish Electric Corporation
    Inventor: Satoshi Hamamoto
  • Publication number: 20140285985
    Abstract: Provided is an electronic control device, in which positioning of a case including a connector housing portion and a pin header portion of a connector mounted on an electronic circuit board may be carried out easily with high accuracy so that ease of assembly and a water-proof property of the connector are improved. The electronic control device includes: an electronic circuit board (1) on which a pin header (30) used for electric connection to an external device is mounted together with an electronic component (11); and a case (2) for receiving the electronic circuit board therein, the case including a connector housing portion (31) provided as an opening portion (310) at a position corresponding to the pin header. A cover (20) of the case including the connector housing portion and the pin header mounted on the electronic circuit board have a first positioning structure using press-fit.
    Type: Application
    Filed: August 21, 2013
    Publication date: September 25, 2014
    Applicant: MITSUBISH ELECTRIC CORPORATION
    Inventors: Takaaki TANAKA, Hisakazu YAMANE
  • Publication number: 20110035776
    Abstract: The purpose of the present invention is to provide an on-train information service system and a passenger train-use information displaying device, with which both a landscape viewing effect and an information delivering effect can be achieved and landscape-related information can be presented at the most suitable timing, and the on-train information service system that is applied to a passenger train and presents image information is equipped with: a passenger train-use information displaying device that uses as a display area part of a window pane of the passenger train or a peripheral area of the window pane; and a display information processing unit that outputs, in correspondence with a landscape that is viewed through the window pane, display information related to the landscape.
    Type: Application
    Filed: March 3, 2009
    Publication date: February 10, 2011
    Applicant: MITSUBISH ELECTRIC CORPORATION
    Inventor: Norie Nagai
  • Publication number: 20080207245
    Abstract: A mobile communications system in which plural possible values for a maximum number of non-serving base stations which can be selected by a base station control apparatus are made available, and the maximum number is set up among the plural possible values for the maximum number of non-serving base station made available according to the capability of mobile terminal. Thereby, in a case in which the mobile terminal has a low transmission rate, an advantage of being able to reduce the circuit size of the receiving circuit of the mobile terminal is realized.
    Type: Application
    Filed: August 4, 2005
    Publication date: August 28, 2008
    Applicant: MITSUBISH ELECTRIC CORPORATION
    Inventors: Hideji Wakabayashi, Miho Maeda
  • Patent number: 5679625
    Abstract: A method of making a superconducting thin film of a Y--Ba--Cu--O series material by using a diode parallel plate type sputtering apparatus including a vacuum chamber, a substrate disposed within the vacuum chamber and having a substantially flat surface on which the superconducting thin film is to be formed, and a plate-shaped target functioning as a cathode and disposed within the vacuum chamber to parallelly face to the flat surface of the substrate, the target being made of the same material as the superconducting thin film, a plasma gas being introduced into the vacuum chamber, and a voltage being applied between the cathode and the substrate, wherein the method comprises the steps of applying a high frequency voltage having a frequency higher than 40 MHz between the cathode and the substrate to generate plasma of the introduced gas, superimposing a DC voltage (V) on the high frequency voltage in a polarity that the cathode becomes negative, and setting the DC voltage at a value where the DC voltage is su
    Type: Grant
    Filed: November 22, 1995
    Date of Patent: October 21, 1997
    Assignees: Nippon Steel Corporation, International Superconductivity Technology Center, Mitsubish Electric Corporation, Hokkaido Electric Power Co., Inc.
    Inventors: Wataru Ito, Tadataka Morishita, Norio Homma, Yukihisa Yoshida