Patents Assigned to Mitsugu Hanabusa
  • Patent number: 6057233
    Abstract: To produce a high quality thin film by effectively removing the particles from the emitted substance and the oxygen retained under a high vacuum during the production of the thin film by laser ablation, there is provided a process for producing a thin film on a substrate by laser ablation in a vacuum chamber in which a laser beam is irradiated to a target to cause emission of a substance from the target and allowing the emitted substance to deposit on the substrate to grow a thin film on the substrate by laser ablation, the process including irradiating an ion beam to at least one of the substrate and a plume of the emitted substance formed between the substrate and the target.
    Type: Grant
    Filed: January 14, 1997
    Date of Patent: May 2, 2000
    Assignees: Toyota Jidosha Kabushiki Kaisha, Mitsugu Hanabusa
    Inventors: Naoki Nakamura, Hiroshi Hasegawa, Mitsugu Hanabusa