Abstract: A RF generator includes a RF power source configured to generate an output signal at an output frequency, and an extremum-seeking frequency controller configured to generate a frequency control signal. The frequency control signal varies the output frequency of the RF power source, and the frequency control signal is formed from a gradient signal. The RF generator further includes a gradient estimator configured to generate the gradient signal. A frequency of the frequency control signal is adjusted based on the gradient signal. The gradient estimator is configured to receive frequency values of the frequency control signal and corresponding output response values, and the gradient signal is generated based on the frequency values and the output response values. Other example RF generators, methods for extremum-seeking frequency control of a RF generator, and control systems for controlling a RF generator are also disclosed.

Abstract: A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.

Abstract: Devices and methods for mass flow verification are provided. A mass flow verifier includes a chamber configured to receive a fluid, a critical flow nozzle upstream of the chamber, a chamber valve, a downstream valve, and a bypass valve. The chamber valve is configured to selectively enable fluid flow from the critical flow nozzle to the chamber. The downstream valve is configured to selectively enable fluid flow from the chamber to a downstream location. The bypass valve is configured to selectively enable fluid flow from the critical flow nozzle to a dump location. The mass flow verifier further includes a controller configured to verify flow rate of the fluid based on a rate of rise in pressure of the fluid as detected by a pressure sensor in the chamber.

Abstract: A plasma source is configured to be in fluid communication with the interior of a vacuum vessel, a vacuum chamber, such as by being installed in a wall of a vacuum vessel that encloses the chamber, or in a pipe that is connected to the chamber. The plasma source may produce plasma in a line of sight of a surface to be cleaned, such as an internal surface of the vessel, which may be used for processes such as deposition or etching.

Abstract: A radio frequency (RF) generator includes a power source configured to generate an RF signal applied to the load and a power controller coupled to the power source. The power controller is configured to generate a control signal to vary the RF signal, wherein the control signal adjusts a frequency of the RF signal in accordance with an external RF signal applied to the load. The frequency adjustment is variable in accordance with a cost responsive to a perturbation of the frequency of the RF signal.

Abstract: A plasma apparatus of a plasma processing system is provided. The plasma apparatus defines a toroidal plasma channel and includes multiple end blocks defining respective portions of the toroidal plasma channel. Each end block includes an end-block tube constructed from a first electrically conductive material and a dielectric coating disposed on an interior surface of the end-block tube. The plasma apparatus also includes multiple mid-blocks defining respective portions of the toroidal plasma channel. Each mid-block includes at least one heat sink located adjacent to a substantially linear tube with a thermal interface disposed therebetween. The thermal interface is in physical communication with the tube and the at least one heat sink. The mid-block tube has a substantially uniform wall thickness and is constructed from a dielectric material. The at least one heat sink is constructed from a second electrically conductive material.

Abstract: A radio frequency (RF) power generation system includes a RF power source that generates a RF output signal delivered to a load. A RF power controller is configured to generate a control signal to vary the RF output signal. The controller adjusts a parameter associated with the RF output signal, and the parameter is controlled in accordance with a trigger signal. The parameter is adjusted in accordance with a cost function, and the cost function is determined by intruding a perturbation into an actuator that affects the cost function. The actuator may control an external RF output signal, and the trigger signal may vary in accordance with the external RF output signal.

Abstract: A thermal conductivity gauge measures gas pressure within a chamber. A sensor wire and a resistor form a circuit coupled between a power input and ground, where the sensor wire extends into the chamber and connects to the resistor via a terminal. A controller adjusts the power input, as a function of a voltage at the terminal and a voltage at the power input, to bring the sensor wire to a target temperature. Based on the adjusted power input, the controller can determine a measure of the gas pressure within the chamber.

Abstract: A plasma source, comprising a plasma source body, comprising: a plurality of magnetic cores, a plurality of primary windings capable of being energized, and a cooling structure, wherein one or more sections of the plasma source body comprising a dielectric material, and wherein, when the plurality of primary windings are energized, a plasma forms around an outer portion of the plasma source body.

Abstract: A plasma source is provided that is configured to form a section of a wall of a vacuum component. The plasma source comprises a body including a dielectric member, a first surface exposed to an exterior region of the vacuum component, and a second surface exposed to an interior region of the vacuum component. The plasma source also comprises at least one electrode disposed in a receiving channel of the body with at least a portion of the dielectric member located adjacent to the at least one electrode in the receiving channel. The plasma source further comprise at least one discharge region adjacent to the receiving channel within the body. The at least one discharge region is exposed to the interior region of the vacuum component via an opening on the second surface of the body.

Abstract: A radio frequency (RF) generator includes a RF power source configured to output an RF power signal, and a controller coupled to the RF power source. The controller is configured to generate a pulse to modulate the RF power signal of the RF power source. The pulse includes one or more state transitions. The controller is further configured to receive a sync signal indicative of one or more operating characteristics or parameters of another RF generator, and adjust at least one of the state transitions of the pulse to synchronize the state transition with a defined phase of the received sync signal. Other example RF generators, RF power delivery systems including one or more RF generators, and control methods for adjusting a state transition of a pulse to synchronize the state transition with a defined phase of a sync signal are also disclosed.

Abstract: A thermal conductivity gauge implements a model of power dissipation to accurately measure gas pressure. An envelope surrounds a gas volume, and a sensor wire is positioned within the gas volume. The controller provides a model of power dissipation from the thermal conductivity gauge, including power loss due to conductive heat loss from sensor wire end contacts, radiative loss from the sensor wire toward the gas envelope, and pressure dependent conductive heat loss from the sensor wire through surrounding gas. The controller then applies a power input to the sensor wire to heat the sensor wire, and measures total power dissipation WT, sensor wire temperature Ts, and envelope temperature Te during the application of the power input. Gas pressure within the envelope is determined based on the measured WT, Ts and Te and the model of power dissipation.

Abstract: A RF power generator has a RF power source configured to generate an output signal. A power splitter is configured to receive the output signal and generate a plurality of split signals. A demagnetizing circuit is configured to receive the plurality of split signals. The demagnetizing circuit is configured to include a plurality of inductances corresponding to the plurality of split signals. The plurality of inductances is configured to reduce the effects of mutual impedance of an ICP chamber in series with the plurality of inductances so that a ratio between a pair of the plurality of split signals varies substantially linearly as one of the pair of the plurality of split signals is varied.

Abstract: A plasma chamber of a plasma processing system is provided. The plasma chamber defines a plasma channel having a first side and a second side oppositely disposed along a length of the plasma channel. The plasma chamber comprises a first section and a second section constructed from a dielectric material and an interface that bonds together the first and second sections at between a first flange of the first section and a third flange of the second section and between a second flange of the first section and a fourth flange of the second section.

Abstract: A switched capacitor modulator (SCM) includes a RF power amplifier. The RF power amplifier receives a rectified voltage and a RF drive signal and modulates an input signal in accordance with the rectified voltage to generate a RF output signal to an output terminal. A reactance in parallel with the output terminal is configured to vary in response to a control signal to vary an equivalent reactance in parallel with the output terminal. A controller generates the control signal and a commanded phase. The commanded phase controls the RF drive signal. The reactance is at least one of a capacitance or an inductance, and the capacitance or the inductance varies in accordance with the control signal.

Abstract: A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.

Abstract: A load lock pressure gauge comprises a housing configured to be coupled to a load lock vacuum chamber. The housing supports an absolute vacuum pressure sensor that provides instantaneous high vacuum pressure signal over a range of high vacuum pressures and a differential diaphragm pressure sensor that provides an instantaneous differential pressure signal between load lock pressure and ambient pressure. The housing further supports an absolute ambient pressure sensor. A low vacuum absolute pressure is computed from the instantaneous differential pressure signal and the instantaneous ambient pressure signal. A controller in the housing is able to recalibrate the differential diaphragm pressure sensor based on measured voltages of the sensor and a measured ambient pressure during normal operation of the pressure gauge with routine cycling of pressure in the load lock.

Abstract: A power supply apparatus, comprising at least one circuit board having thereon at least a first single phase power factor controlled (PFC) circuit, and a second PFC corrected circuit, the first single phase PFC circuit and the second PFC corrected circuit each having at least one PFC device in communication with at least one inverter, at least one resonant (LC) circuit positioned on the at least one circuit board and in electrical communication with at least one of the first single phase PFC circuit and the second PFC corrected circuit, at least one transformer in communication with at least one of the first single phase PFC circuit and the second PFC corrected circuit via the at least one LC resonant circuit, the at least one transformer configured to generate at least one transformer output signal, and at least one capacitor in communication with the at least one transformer and configured to output at least one magnetron input signal in response to the at least one transformer output signal, and at least o

Abstract: Mass flow controllers that can provide for improved bleeding time and can be manufactured with less complexity and cost are provided. A mass flow controller includes a body having a valve outlet bore defining a flow path and an adjustable valve configured to control flow of a gas through the flow path. A valve element includes an outlet orifice of the adjustable valve and is disposed within the bore. The mass flow controller further includes a pressure drop element disposed coaxially with the valve element within the bore. An upstream pressure sensor is configured to detect a pressure at a location in the flow path between the adjustable valve and the pressure drop element, and a controller is configured to determine a flow rate through the flow path based on pressure as detected by the upstream pressure sensor.

Abstract: A power supply system includes a RF power source configured to generate an output signal at an output frequency, a signal source configured to generate a perturbation signal, an extremum seeking frequency controller configured to generate a frequency control signal based on the perturbation signal, and a frequency selector configured to select a perturbation frequency of the perturbation signal that is isolated from at least one frequency tone associated with the power supply system. The frequency control signal varies the output frequency of the RF power source. Other example power supply system, methods for controlling a RF generator, and control systems for controlling a RF generator are also disclosed.