Patents Assigned to Modular Process Technology
  • Patent number: 5783834
    Abstract: A robot with a moveable arm is taught precise position data for the various locations it must attain during operation. The arm moves vertically, radially and angularly and is provided with an end effector which is used to grip the object being transported by the robot. The end effector is modified to allow effective position training before normal operation and to provide a warning signal during normal operation. Horizontal locations are taught by recording the angular and radial coordinates at which a modified section of the end effector is lined up with a vertical locating beam. Vertical positions are taught by recording the vertical coordinates at which a second locating signal is detected at the front edge of the end effector. This signal also serves as a warning signal during normal operation.
    Type: Grant
    Filed: February 20, 1997
    Date of Patent: July 21, 1998
    Assignee: Modular Process Technology
    Inventor: Steven C. Shatas
  • Patent number: 5749966
    Abstract: An improved plasma enhanced chemical vapor deposition (CVD) reactor is provided for the synthesis of diamond and other high temperature materials such as boron nitride, boron carbide and ceramics containing oxides, nitrides, carbides and borides, or the like. An aspect of the present method enables a plasma to substrate distance to be optimized for a given surface. This has been found to enable a substantially uniform thin film coating of diamond or like material to be deposited over a substrate.
    Type: Grant
    Filed: October 14, 1994
    Date of Patent: May 12, 1998
    Assignee: Modular Process Technology Corp.
    Inventor: Steven C. Shates
  • Patent number: 5387288
    Abstract: An improved plasma enhanced chemical vapor deposition (CVD) reactor is provided for the synthesis of diamond and other high temperature materials such as boron nitride, boron carbide and ceramics containing oxides, nitrides, carbides and borides, or the like. An aspect of the present method enables a plasma to substrate distance to be optimized for a given surface. This has been found to enable a substantially uniform thin film coating or diamond or lake material to be deposited over a substrate.
    Type: Grant
    Filed: May 14, 1993
    Date of Patent: February 7, 1995
    Assignee: Modular Process Technology Corp.
    Inventor: Steven C. Shatas