Patents Assigned to Modular Process Technology Corp.
  • Process for depositing diamond and refractory materials
    Patent number: 5749966
    Abstract: An improved plasma enhanced chemical vapor deposition (CVD) reactor is provided for the synthesis of diamond and other high temperature materials such as boron nitride, boron carbide and ceramics containing oxides, nitrides, carbides and borides, or the like. An aspect of the present method enables a plasma to substrate distance to be optimized for a given surface. This has been found to enable a substantially uniform thin film coating of diamond or like material to be deposited over a substrate.
    Type: Grant
    Filed: October 14, 1994
    Date of Patent: May 12, 1998
    Assignee: Modular Process Technology Corp.
    Inventor: Steven C. Shates
  • Apparatus for depositing diamond and refractory materials comprising rotating antenna
    Patent number: 5387288
    Abstract: An improved plasma enhanced chemical vapor deposition (CVD) reactor is provided for the synthesis of diamond and other high temperature materials such as boron nitride, boron carbide and ceramics containing oxides, nitrides, carbides and borides, or the like. An aspect of the present method enables a plasma to substrate distance to be optimized for a given surface. This has been found to enable a substantially uniform thin film coating or diamond or lake material to be deposited over a substrate.
    Type: Grant
    Filed: May 14, 1993
    Date of Patent: February 7, 1995
    Assignee: Modular Process Technology Corp.
    Inventor: Steven C. Shatas