Abstract: Systems and methods for controlling velocity of a contact line and height profile between a template and a substrate during imprinting of polymerizable material are described.
Abstract: The present invention features a method of patterning a substrate that includes forming, on the substrate, a multi-layer film with a surface, an etch rate interface and an etch-differential interface. The etch-differential interface is defined between the etch rate interface and the surface. A recorded pattern is transferred onto the substrate defined, in part, by the etch-differential interface.
Type:
Grant
Filed:
September 21, 2004
Date of Patent:
April 17, 2007
Assignee:
Molecular Imprints
Inventors:
Nicholas A. Stacey, Sidlgata V. Sreenivasan, Michael N. Miller