Patents Assigned to Molecular Imprints, Inc.
  • Optical system for use in stage control
    Patent number: 8345242
    Abstract: Imprint lithography benefits from precise alignment between a template and a substrate during imprinting. A moiré signal resulting from indicia on the template and the substrate are acquired by a system comprising a line-scan camera and a digital micromirror device (DMD) which provides a high bandwidth, low-latency signal. Once acquired, the moiré signal may be used directly to align the template and the substrate without need for discrete position/angle encoders.
    Type: Grant
    Filed: October 16, 2009
    Date of Patent: January 1, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Philip D. Schumaker, Babak Mokaberi
  • Step and repeat imprint lithography process
    Patent number: 8318066
    Abstract: The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
    Type: Grant
    Filed: May 16, 2011
    Date of Patent: November 27, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Byung-Jin Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario Johannes Meissl
  • REDUCED RESIDUAL FORMATION IN ETCHED MULTI-LAYER STACKS
    Publication number: 20120288686
    Abstract: A multi-layer stack for imprint lithography is formed by applying a first polymerizable composition to a substrate, polymerizing the first polymerizable composition to form a first polymerized layer, applying a second polymerizable composition to the first polymerized layer, and polymerizing the second polymerizable composition to form a second polymerized layer on the first polymerized layer. The first polymerizable composition includes a polymerizable component with a glass transition temperature less than about 25° C., and the first polymerized layer is substantially impermeable to the second polymerizable composition.
    Type: Application
    Filed: July 11, 2012
    Publication date: November 15, 2012
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Frank Y. Xu, Weijun Liu, Cynthia B. Brooks, Dwayne L. LaBrake, David J. Lentz
  • Separation in an imprint lithography process
    Patent number: 8309008
    Abstract: Systems, methods, and processes for separating a template from a substrate retained on an air cavity chuck during an imprint lithography process. Generally, vacuum level provided by air cavity chuck may be controlled during conforming of polymerizable material between the template and the substrate and during separation of the template and the substrate.
    Type: Grant
    Filed: October 21, 2009
    Date of Patent: November 13, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Mahadevan Ganapathisubramanian
  • Optically Absorptive Material for Alignment Marks
    Publication number: 20120269972
    Abstract: Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
    Type: Application
    Filed: April 25, 2012
    Publication date: October 25, 2012
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Niyaz Khusnatdinov, Kosta S. Selinidis, Joseph Michael Imhof, Dwayne L. LaBrake
  • Method for expelling gas positioned between a substrate and a mold
    Patent number: 8282383
    Abstract: The present invention is directed towards a system for expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: October 9, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Sidlgata V. Sreenivasan, Ian Matthew McMackin, Pankaj B. Lad
  • Imprint lithography method
    Patent number: 8268220
    Abstract: Improved wetting characteristics together with improved release characteristics with respect to a substrate and an imprint lithography mold having imprinting material disposed therebetween.
    Type: Grant
    Filed: October 15, 2010
    Date of Patent: September 18, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Frank Y. Xu, Pankaj B. Lad, Ian Matthew McMackin, Van Nguyen Truskett, Edward Brian Fletcher
  • High Aspect Ratio Patterning of Silicon
    Publication number: 20120214066
    Abstract: A silicon nanowire array including a multiplicity of silicon nanowires extending from a silicon substrate. Cross-sectional shape of the silicon nanowires and spacing between the silicon nanowires can be selected to maximize the ratio of the surface area of the silicon nanowires to the volume of the nanowire array. Methods of forming the silicon nanowire array include a nanoimprint lithography process to form a template for the silicon nanowire array and an electroless etching process to etch the template formed by the nanoimprint lithography process.
    Type: Application
    Filed: February 16, 2012
    Publication date: August 23, 2012
    Applicants: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM, MOLECULAR IMPRINTS, INC.
    Inventors: Michael N. Miller, Fen Wan, Vikramjit Singh, Darren D. Donaldson, Gerard M. Schmid, Sidlgata V. Sreenivasan, Frank Y. Xu
  • PHOTOCATALYTIC REACTIONS IN NANO-IMPRINT LITHOGRAPHY PROCESSES
    Publication number: 20120201969
    Abstract: An imprint lithography template having a photoactive coating adhered to a surface of the template. Irradiation of the photoactive coating promotes cleaning of the template by decomposition of organic material proximate the template (e.g., organic material adsorbed on the template). An imprint lithography system may be configured such that template cleaning is achieved during formation of a patterned layer on an imprint lithography substrate. Cleaning of the template during an imprint lithography process reduces down-time that may be associated with template maintenance.
    Type: Application
    Filed: April 13, 2012
    Publication date: August 9, 2012
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Edward B. Fletcher, Frank Y. Xu
  • Energy sources for curing in an imprint lithography system
    Patent number: 8237133
    Abstract: Energy sources and methods for curing in an imprint lithography system are described. The energy sources may include one or more energy elements positioned outside of the viewing range of an imaging unit monitoring elements of the imprint lithography system. Each energy source is configured to provide energy along a path to solidify polymerizable material on a substrate.
    Type: Grant
    Filed: July 29, 2009
    Date of Patent: August 7, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Mahadevan Ganapathisubramanian, Byung-Jin Choi, Liang Wang, Alex Ruiz
  • Substrate alignment
    Patent number: 8231821
    Abstract: Systems and methods for imprinting a patterned layer on a substrate are described. Features of patterned layer may be concentrically imprinted in relation to a shaft positioned on a substrate chuck. The substrate may be biased using a radius difference between a diameter of the shaft and an inner diameter of the substrate in relation to a point on an inner edge of the substrate.
    Type: Grant
    Filed: November 2, 2009
    Date of Patent: July 31, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Pawan Kumar Nimmakayala, Mahadevan GanapathiSubramanian
  • Controlling Thickness of Residual Layer
    Publication number: 20120189780
    Abstract: Methods for manufacturing a patterned surface on a substrate are described. Generally, the patterned surface is defined by a residual layer having a thickness of less than approximately 5 nm.
    Type: Application
    Filed: March 26, 2012
    Publication date: July 26, 2012
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Dwayne L. LaBrake, Niyaz Khusnatdinov, Christopher Ellis Jones, Frank Y. Xu
  • CRITICAL DIMENSION CONTROL DURING TEMPLATE FORMATION
    Publication number: 20120187085
    Abstract: Thickness of a residual layer may be altered to control critical dimension of features in a patterned layer provided by an imprint lithography process. The thickness of the residual layer may be directly proportional or inversely proportional to the critical dimension of features. Dispensing techniques and material selection may also provide control of the critical dimension of features in the patterned layer.
    Type: Application
    Filed: April 6, 2012
    Publication date: July 26, 2012
    Applicant: Molecular Imprints, Inc.
    Inventors: Cynthia B. Brooks, Dwayne L. LaBrake, Niyaz Khusnatdinov, Michael N. Miller, Sidlgata V. Sreenivasan, David James Lentz, Frank Y. Xu
  • Imprint lithography system and method
    Patent number: 8215946
    Abstract: System, method and process for imprinting a substrate using controlled deformation of a substrate and/or a template. The substrate and/or template may be positioned in single wave formation or double wave formation during an imprint lithography process.
    Type: Grant
    Filed: October 20, 2009
    Date of Patent: July 10, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Mahadevan GanapathiSubramanian, Byung-Jin Choi, Mario Johannes Meissl
  • Single phase fluid imprint lithography method
    Patent number: 8211214
    Abstract: The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to either the viscous liquid, the substrate, the template, or a combination thereof. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
    Type: Grant
    Filed: February 5, 2008
    Date of Patent: July 3, 2012
    Assignees: Molecular Imprints, Inc., Board of Regents, The University of Texas
    Inventors: Frank Y. Xu, Niyaz Khusnatdinov
  • Large area roll-to-roll imprint lithography
    Patent number: 8187515
    Abstract: Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.
    Type: Grant
    Filed: March 31, 2009
    Date of Patent: May 29, 2012
    Assignees: Molecular Imprints, Inc., Board of Regents, The University of Texas
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Byung Jin Choi, Ian Matthew McMackin
  • NANOIMPRINT LITHOGRAPHY FORMATION OF FUNCTIONAL NANOPARTICLES USING DUAL RELEASE LAYERS
    Publication number: 20120114559
    Abstract: Functional nanoparticles may be formed using at least one nanoimprint lithography step. In one embodiment, sacrificial material may be patterned on a multilayer substrate including one or more functional layers between removable layers using an imprint lithography process. At least one of the functional layers includes a functional material such as a pharmaceutical composition or imaging agent. The pattern may be further etched into the multilayer substrate. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Removing the removable layers releases the pillars from the patterned structure to form functional nanoparticles such as drug or imaging agent carriers.
    Type: Application
    Filed: November 4, 2011
    Publication date: May 10, 2012
    Applicants: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM, MOLECULAR IMPRINTS, INC.
    Inventors: Vikramjit Singh, Frank Y. Xu, Sidlgata V. Sreenivasan
  • Template Pillar Formation
    Publication number: 20120111832
    Abstract: Methods for forming an imprint lithography template are provided. Materials for forming the imprint lithography template may be etched at different rates based on physical properties of the layers. Additionally, reflectance of the materials may be monitored to provide substantially uniform erosion of the materials.
    Type: Application
    Filed: January 18, 2012
    Publication date: May 10, 2012
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Gary F. Doyle, Gerard M. Schmid, Michael N. Miller, Douglas J. Resnick, Dwayne L. LaBrake
  • PATTERNING OF NON-CONVEX SHAPED NANOSTRUCTURES
    Publication number: 20120112385
    Abstract: Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.
    Type: Application
    Filed: November 7, 2011
    Publication date: May 10, 2012
    Applicants: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM, MOLECULAR IMPRINTS, INC.
    Inventors: Sidlgata V. Sreenivasan, Vikramjit Singh, Frank Y. Xu, Byung-Jin Choi
  • Composition to reduce adhesion between a conformable region and a mold
    Patent number: 8152511
    Abstract: An imprint lithography mold assembly includes a mold having a surface, a substrate having a surface, and a polymerizable composition disposed between the surface of the mold and the surface of the substrate. The polymerizable composition includes a bulk material and a non-ionic surfactant having a first end and a second end. The first end of the non-ionic surfactant has an affinity for the bulk material, and the second end of the non-ionic surfactant is fluorinated.
    Type: Grant
    Filed: March 13, 2009
    Date of Patent: April 10, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Frank Y. Xu, Michael N. Miller