Patents Assigned to Motoyama Eng. Works, Ltd.
  • Patent number: 6769697
    Abstract: There is provided a gasket comprising a sealing portion and a deformation stopper portion. When the gasket is placed between adjacent surfaces to be sealed of two objects, the sealing portion is engaged by the adjacent surfaces. The deformation stopper portion is engaged by the adjacent surfaces of the objects when the sealing portion has been deformed by a predetermined amount by the adjacent surfaces, thereby preventing excessive deformation of the sealing portion.
    Type: Grant
    Filed: September 8, 2000
    Date of Patent: August 3, 2004
    Assignees: Ace Inc., Motoyama Eng. Works, Ltd., TFC Corporation, Isono Mfg. Inc.
    Inventors: Koichi Ishikawa, Osamu Uchisawa, Toshikatsu Meguro, Hideo Tsukazaki, Tatsuhito Tanaka
  • Patent number: 6157774
    Abstract: A vapor generating apparatus comprises: a convergent-divergent nozzle 50 having an inlet port 50a and an outlet port 50a for a gas for a vapor medium, the convergent-divergent nozzle 50 comprising a convergent nozzle portion 51a, which is formed so as to be tapered and narrowed from the inlet port 50a toward the outlet port 50b, and a divergent nozzle portion 51c, which is formed so as to be expanded from the convergent nozzle portion 51a toward the outlet port 50b; and a supply port 54 for a liquid to be evaporated, the supply port 54 being open to the divergent nozzle portion 51c of the convergent-divergent nozzle 50. Thus, it is possible to easily produce a gas using a smaller number of control factors, and it is possible to increase the amount of produced gas and decrease the vapor generating time.
    Type: Grant
    Filed: May 15, 1998
    Date of Patent: December 5, 2000
    Assignees: Tokyo Electron Limited, Motoyama Eng. Works, Ltd.
    Inventors: Mitsuaki Komino, Osamu Uchisawa
  • Patent number: 6134807
    Abstract: A drying processing apparatus for supplying a dry gas to a processing chamber 35, which houses therein semiconductor wafers W, to dry the semiconductor wafers W, including a heater 32 for heating N.sub.2 gas serving as a carrier gas; a vapor generator 34 for making IPA misty by using the N.sub.2 gas heated by the heater 32 and for heating the IPA to produce the dry gas; and a flow control element 36 for supplying a predetermined rate of N.sub.2 gas to the processing chamber 35. Thus, it is possible to improve the efficiency of heat transfer of N.sub.2 gas, and it is possible to increase the amount of produced IPA gas and decrease the time to produce IPA gas. In addition, it is possible to prevent the turbulence of atmosphere in the processing chamber 35 after the drying processing is completed.
    Type: Grant
    Filed: May 15, 1998
    Date of Patent: October 24, 2000
    Assignees: Tokyo Electron Limited, Motoyama Eng. Works, Ltd.
    Inventors: Mitsuaki Komino, Osamu Uchisawa
  • Patent number: 6131307
    Abstract: A pressure and flow rate of a gas flowing into or out of a processing chamber are controlled, so as to decrease or increase an atmosphere in the processing chamber higher or lower than a target pressure to obtain a target pressure. During a first period, an opening speed of an opening degree adjusting device provided in an inlet pipe communicating to the processing chamber is controlled to a first target value toward a first predetermined functional approximation line (for example a function of second degree) as ideal value. During the rest of periods other than the first period, the opening speed is controlled stepwise to two or more predetermined target values so that the processing chamber reaches the target pressure. During a period before the first period, the opening speed may be controlled to a second target value among the two or more target values, based on a control amount for the opening degree adjusting device.
    Type: Grant
    Filed: August 5, 1998
    Date of Patent: October 17, 2000
    Assignees: Tokyo Electron Limited, Motoyama Eng. Works, Ltd.
    Inventors: Mitsuaki Komino, Osamu Uchisawa, Yasuhiro Chiba
  • Patent number: 5172722
    Abstract: A stop valve for a vacuum apparatus comprises a valve casing having an inlet port and an outlet port, a main valve element housed in the valve casing for selectively opening and closing a flow passageway for causing the inlet port to comunicate with the outlet port, an auxiliary valve element for selectively opening and closing an orifice formed in the main valve element and capable of opening the flow passageway by opening the orifice when the main valve element is closed, a valve shaft for driving the main valve element and the auxiliary element, and a control mechanism for controlling the operation of the valve shaft and opening the main valve element after the auxiliary valve element has been opened.
    Type: Grant
    Filed: September 12, 1991
    Date of Patent: December 22, 1992
    Assignee: Motoyama Eng. Works, Ltd.
    Inventor: Koichi Nishimura
  • Patent number: 4953826
    Abstract: A metal diaphragm valve comprises a valve cage, a metallic valve seat integral with the valve cage, a metal diaphragm having a peripheral edge portion supported in a liquid-tight manner by the valve cage and a central portion facing the valve to touch and leave the seat, a drive member for opening and closing the metal diaphragm, and a diaphragm pressing member interposed between the drive member and the metal diaphragm and adapted to press the diaphragm against the valve seat at a uniform sealing pressure.
    Type: Grant
    Filed: August 4, 1989
    Date of Patent: September 4, 1990
    Assignee: Motoyama Eng. Works, Ltd.
    Inventors: Tadahiro Ohmi, Yohichi Kanno, Kazuhiko Satoh, Tadahiro Hatayama
  • Patent number: RE34303
    Abstract: A metal diaphragm valve comprises a valve cage, a metallic valve seat integral with the valve cage, a metal diaphragm having a peripheral edge portion supported in a .[.liquid-tight.]. .Iadd.fluid-tight .Iaddend.manner by the valve cage and a central portion facing the valve to touch and leave the seat, a drive member for opening and closing the metal diaphragm, and a diaphragm pressing member interposed between the drive member and the metal diaphragm and adapted to press the diaphragm against the valve seat at a uniform sealing pressure.
    Type: Grant
    Filed: March 10, 1992
    Date of Patent: July 6, 1993
    Assignee: Motoyama Eng. Works, Ltd.
    Inventors: Tadahiro Ohmi, Yohichi Kanno, Kazuhiko Satoh, Tadahiro Hatayama