Patents Assigned to M.P.C. Micropulse Plating Concepts
  • Patent number: 7943032
    Abstract: The present invention relates to an anode for electroplating, which has an anode base and a shield and is characterized in that additive degradation is reduced when it is used in electroplating.
    Type: Grant
    Filed: December 23, 2003
    Date of Patent: May 17, 2011
    Assignees: Metakem Gesellschaft fur Schichtchemie der Metalle mbH, M.P.C. Micropulse Plating Concepts
    Inventors: Jorg Wurm, Stephane Menard