Abstract: A method for texturing an active surface of a photovoltaic cell in single-crystal silicon or poly-crystal silicon includes depositing a resin on the active surface of the cell, texturing the resin on the active surface with geometric patterns, and texturing the active surface of the cell by eliminating the deposited resin. The depositing of the resin is preceded by pre-texturing the resin on a depositing tool. The texturing step of the resin on the active surface is simultaneous with the depositing of the resin on the active surface.
Type:
Grant
Filed:
July 5, 2012
Date of Patent:
August 20, 2013
Assignee:
MPO Energy
Inventors:
Bernard Bechevet, Johann Jourdan, Sylvin De Magnienville, Sébastien Thibert, Nadège Reverdy-Bruas, Didier Chaussy, Davide Beneventi
Abstract: A method for texturing an active surface of a photovoltaic cell in single-crystal silicon or poly-crystal silicon includes depositing a resin on the active surface of the cell, texturing the resin on the active surface with geometric patterns, and texturing the active surface of the cell by eliminating the deposited resin. The depositing of the resin is preceded by pre-texturing the resin on a depositing tool. The texturing step of the resin on the active surface is simultaneous with the depositing of the resin on the active surface.
Type:
Application
Filed:
July 5, 2012
Publication date:
January 10, 2013
Applicant:
MPO Energy
Inventors:
Bernard Bechevet, Johann Jourdan, Sylvin De Magnienville, Sébastien Thibert, Nadège Reverdy-Bruas, Didier Chaussy, Davide Beneventi