Patents Assigned to MRB Process Tech LLC
  • Plasma Treatment System With Multiple Horizontal Channels
    Publication number: 20210101804
    Abstract: A system with electrical discharge plasma for treating a liquid, the system includes a sealed process tank and multiple EDP channels. The EDP channel consists of a cathode and an anode, a gas hood and a gas diffuser. The EDP channel possesses cathode above the water surface and anode below the water surface. The EDP channel possesses gas hood at the top of the EDP channel and gas diffuser at the bottom of the EDP channel. The system with electrical discharge plasma used for destruction of contaminants in water or wastewater.
    Type: Application
    Filed: September 21, 2020
    Publication date: April 8, 2021
    Applicant: MRB Process Tech LLC
    Inventor: James B. Garber