Patents Assigned to MSP Corporation
  • Patent number: 9797593
    Abstract: An apparatus and method for generating a vapor with a compact vaporizer design and exposing the gas and liquid mixture for vaporization to a reduced maximum temperature. A gas and liquid droplet flow through a metal housing configured to heat the gas and liquid droplet mixture flow for vaporization includes directing the gas and liquid droplet mixture through an inlet of the metal housing and flowing the gas through a tortious flow path defined by a plurality of tubular flow passageways arranged around a central axis for vaporization. Residual liquid droplets may be further vaporized by flowing through a second metal housing configured to heat the gas and liquid droplet mixture for vaporization and having a similar construction to the first metal housing and providing a second tortious flow path.
    Type: Grant
    Filed: May 11, 2015
    Date of Patent: October 24, 2017
    Assignee: MSP Corporation
    Inventors: Thuc M. Dinh, Yamin Ma, Benjamin Y. H. Liu
  • Patent number: 9768005
    Abstract: A device and method are disclosed to apply ESI-based mass spectroscopy to submicrometer and nanometer scale aerosol particles. Unipolar ionization is utilized to charge the particles in order to collect them electrostatically on the tip of a tungsten rod. Subsequently, the species composing the collected particles are dissolved by making a liquid flow over the tungsten rod. This liquid with dissolved aerosol contents is formed into highly charged droplets, which release unfragmented ions for mass spectroscopy, such as time-of-flight mass spectroscopy. The device is configured to operate in a switching mode, wherein aerosol deposition occurs while solvent delivery is turned off and vice versa.
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: September 19, 2017
    Assignees: MSP Corporation, Regents of the University of Minnesota
    Inventors: Siqin He, Chris Hogan, Lin Li, Benjamin Y. H. Liu, Amir Naqwi, Francisco Romay
  • Patent number: 9089800
    Abstract: A gas filtration apparatus and method comprises a housing with an inlet for gas to enter and an outlet for the gas to exit. The housing contains a filter comprised of sintered metal fibers having an active filtration area through which the gas flows to remove suspended particles from the gas. The filter is substantially uniform in thickness and porosity through the active filtration area. The filter media being sealed to a metal structure in the housing with the metal structure having an opening to permit gas to flow through. A method of making a vapor/gas mixture includes the steps of producing a vapor in a gas to form the vapor/gas mixture passing the vapor/gas mixture through an opening in a housing containing a filter comprised of sintered metal fibers through which the vapor/gas mixture flows.
    Type: Grant
    Filed: August 9, 2012
    Date of Patent: July 28, 2015
    Assignee: MSP Corporation
    Inventors: Benjamin Y.H. Liu, Yamin Ma, Thuc M. Dinh
  • Patent number: 8986784
    Abstract: A method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.
    Type: Grant
    Filed: July 9, 2013
    Date of Patent: March 24, 2015
    Assignee: MSP Corporation
    Inventors: Benjamin Y. H. Liu, Thuc M. Dinh, Yamin Ma
  • Patent number: 8945281
    Abstract: The present disclosure describes an apparatus and a method for generating IPA vapor for condensation on a substrate in order to provide a vapor that is substantially free of particulate and molecular contaminants. The apparatus includes an inlet for liquid to enter, and a plurality of heated sloped surfaces to create thin sheets of flowing liquid on the surfaces from which the liquid can vaporize to form vapor. The liquid flows from one surface to another, vaporizing the liquid.
    Type: Grant
    Filed: January 30, 2014
    Date of Patent: February 3, 2015
    Assignee: MSP Corporation
    Inventors: Thuc M. Dinh, Yamin Ma, Benjamin Y. H. Liu
  • Patent number: 8728240
    Abstract: Methods and apparatus for recovery of precursor vapor from a gas and precursor vapor mixture used in a deposition process. The gas and precursor vapor mixture is passed through a multitude of heat transfer surfaces in a heat conducting housing causing the precursor vapor to condense. The precursor vapor in liquid form is then collected after condensation.
    Type: Grant
    Filed: November 19, 2012
    Date of Patent: May 20, 2014
    Assignee: MSP Corporation
    Inventors: Benjamin Y. H. Liu, Thuc M. Dinh, Yamin Ma
  • Patent number: 8711338
    Abstract: The present disclosure describes a method and apparatus for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: April 29, 2014
    Assignee: MSP Corporation
    Inventors: Benjamin Y. H. Liu, Thuc M. Dinh, William D. Dick, Aaron M. Collins, Francisco J. Romay
  • Publication number: 20140096715
    Abstract: An apparatus removes particles from a gas/vapor mixture while at the same time improves the uniformity of gas/vapor mixture to create a more uniformly-mixed mixture stream for thin film deposition and semiconductor device fabrication.
    Type: Application
    Filed: December 16, 2013
    Publication date: April 10, 2014
    Applicant: MSP Corporation
    Inventors: Benjamin Y.H. Liu, Yamin Ma, Thuc Dinh
  • Publication number: 20140083167
    Abstract: An apparatus and method for sampling and measuring air born particulate matter includes an inlet for the particulate containing gas to enter. A mechanism then removes coarse particles larger than a selected size while permitting filtered particles of less than the selected size to pass through. A chamber containing a quartz crystal sensor permits the filtered particles that have passed through to deposit to create an output signal in response to the deposited particle mass.
    Type: Application
    Filed: September 19, 2013
    Publication date: March 27, 2014
    Applicant: MSP Corporation
    Inventors: Benjamin Y. H. Liu, Virgil A. Marple, Francisco Romay, Lin Li
  • Patent number: 8603580
    Abstract: A method for vaporizing a liquid for subsequent thin film deposition on a substrate. The method comprises vaporizing a liquid which is disposed within a tubular porous metal body. The porous metal body comprises a first surface defining a first carrier gas flow path and a second surface defining a second carrier gas flow path in a substantially opposite direct to the first carrier flow path. Vapor is generated from the liquid and added to a carrier gas that passes sequentially in direct contact along the first and second surfaces of the porous metal body to form a gas/vapor mixture with the carrier gas first flowing along the first surface and then along the second surface thereby providing a gas/vapor mixture for thin film deposition.
    Type: Grant
    Filed: November 28, 2006
    Date of Patent: December 10, 2013
    Assignee: MSP Corporation
    Inventor: Benjamin Y. H. Liu
  • Patent number: 8603247
    Abstract: The present disclosure describes an apparatus for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector.
    Type: Grant
    Filed: May 6, 2013
    Date of Patent: December 10, 2013
    Assignee: MSP Corporation
    Inventors: Benjamin Y. H. Liu, Thuc M. Dinh, William D. Dick, Aaron M. Collins, Francisco J. Romay
  • Publication number: 20130312674
    Abstract: An apparatus and method for generating vapor from a liquid precursor for a thin film deposition on a substrate includes an inlet section in fluid communication with a downstream vaporization chamber section. The inlet section comprises a gas inlet for receiving gas from a gas source through a gas flow sensor and a gas flow control valve and a liquid inlet for receiving liquid from a liquid source through a liquid flow sensor and a liquid flow control valve. An electronic controller controls the gas and liquid flow control valves thereby controlling the rates of gas and liquid flow into the inlet section to generate vapor in the downstream vaporization chamber section for thin film deposition on the substrate.
    Type: Application
    Filed: August 6, 2013
    Publication date: November 28, 2013
    Applicant: MSP Corporation
    Inventors: Benjamin Y.H. Liu, Yamin Ma, Thuc Dinh
  • Publication number: 20130295776
    Abstract: Methods for recovery of precursor vapor from a gas and precursor vapor mixture used in a deposition process. The gas and precursor vapor mixture is passed through a multitude of heat transfer surfaces in a heat conducting housing causing the precursor vapor to condense. The precursor vapor in liquid form is then collected after condensation.
    Type: Application
    Filed: May 2, 2013
    Publication date: November 7, 2013
    Applicant: MSP Corporation
    Inventors: Benjamin Y.H. Liu, Thuc M. Dinh, Yamin Ma
  • Patent number: 8554064
    Abstract: The present disclosure relates to an apparatus and a method for vaporizing a liquid to form vapor preferably in a gas stream. The apparatus includes a composite metal structure, the structure comprising a plurality of passageways for providing heat to vaporize the liquid in the gas stream to form a gas/vapor mixture. A non-corrosive interface lies between the metal structure and the gas/vapor mixture, the interface being chemically inert to the gas/vapor mixture and the structure permitting heat to be conducted rapidly therethrough to vaporize the liquid. The apparatus further includes an inlet for the gas and an inlet for the liquid to be vaporized to flow into the plurality of passageways and an exit through which the gas/vapor mixture exits the apparatus.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: October 8, 2013
    Assignee: MSP Corporation
    Inventors: Thuc Dinh, Yamin Ma, Benjamin Y. H. Liu
  • Publication number: 20130239888
    Abstract: The present disclosure describes an apparatus for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector.
    Type: Application
    Filed: May 6, 2013
    Publication date: September 19, 2013
    Applicant: MSP Corporation
    Inventors: Benjamin Y.H. Liu, Thuc M. Dinh, William D. Dick, Aaron M. Collins, Francisco J. Romay
  • Patent number: 8529985
    Abstract: A method for atomizing a precursor liquid for vapor generation and thin film deposition on a substrate. The precursor liquid is atomized by a carrier gas to form a droplet aerosol composed of small precursor liquid droplets suspended in the carrier gas. The droplet aerosol is then heated to form vapor, producing a gas/vapor mixture that can be introduced into a deposition chamber to form thin films on a substrate. The liquid is introduced into the atomizing apparatus in such a manner as to avoid excessive heating that can occur or lead to the formation of undesirable by-products due to material degradation as result of thermal decomposition. The method is particularly suited for vaporizing high molecular weight substances with a low vapor pressure that requires a high vaporization temperature for the liquid to vaporize. The method can also be used to vaporize solid precursors dissolved in a solvent for vaporization.
    Type: Grant
    Filed: November 13, 2012
    Date of Patent: September 10, 2013
    Assignee: MSP Corporation
    Inventor: Benjamin Y. H. Liu
  • Patent number: 8511583
    Abstract: The present disclosure relates to an apparatus and a method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The apparatus includes a mechanism to control the rate of liquid flow through the apparatus, the mechanism including a piezoelectric actuator to adjust the rate of liquid flow and an atomizing mechanism drawing gas from a compressed gas source such that when the gas source conjoins with the liquid, the liquid is atomized to form droplets suspended in the gas thereby forming a droplet aerosol suitable for subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.
    Type: Grant
    Filed: February 1, 2011
    Date of Patent: August 20, 2013
    Assignee: MSP Corporation
    Inventors: Benjamin Y. H. Liu, Thuc M. Dinh, Yamin Ma
  • Publication number: 20130203264
    Abstract: A gas filtration apparatus and method comprises a housing with an inlet for gas to enter and an outlet for the gas to exit. The housing contains a filter comprised of sintered metal fibers having an active filtration area through which the gas flows to remove suspended particles from the gas. The filter is substantially uniform in thickness and porosity through the active filtration area. The filter media being sealed to a metal structure in the housing with the metal structure having an opening to permit gas to flow through. A method of making a vapor/gas mixture includes the steps of producing a vapor in a gas to form the vapor/gas mixture passing the vapor/gas mixture through an opening in a housing containing a filter comprised of sintered metal fibers through which the vapor/gas mixture flows.
    Type: Application
    Filed: August 9, 2012
    Publication date: August 8, 2013
    Applicant: MSP Corporation
    Inventors: Benjamin Y.H. Liu, Yamin Ma, Thuc M. Dinh
  • Patent number: 8465791
    Abstract: A method for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector.
    Type: Grant
    Filed: August 31, 2010
    Date of Patent: June 18, 2013
    Assignee: MSP Corporation
    Inventors: Benjamin Y. H. Liu, Thuc M. Dinh, William D. Dick, Aaron M. Collins, Francisco J. Romay
  • Patent number: 8421006
    Abstract: A device for generating sprays of charged droplets, and resulting nanoparticles, the device comprising a first needle connected to an electrical potential line to generate a first spray of charged particles from the first needle, and a second needle spaced apart from and facing the first needle, and connected to an electrical line configured to ground the second needle or to apply a voltage to the second needle that is the same polarity as the voltage applied to the first needle. The device also comprising an electric field modifier connected to the first needle, and configured to modify an electrical field to generate a second spray of charged particles from the second needle.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: April 16, 2013
    Assignee: MSP Corporation
    Inventors: Amir A. Naqwi, Christopher W. Fandrey, Zeeshan H. Syedain