Abstract: Apparatus for non-contact determination of wafer resistance of a semiconductor wafer includes a first sensor element, separated from a surface of the wafer by a first air gap, for capacitively coupling an AC drive signal into a portion of the wafer. A second sensor element, separated from the surface of the wafer by a second air gap, capacitively couples an AC output signal out of the wafer portion. An inductor, in series connection with the sensor elements is included in the sensor/wafer circuit. A frequency of the AC drive signal is automatically tuned to a resonant frequency at which capacitance impedance of the first air gap and of the second air gap is canceled by inductive impedance of the inductor. A voltage value of the drive signal required to drive an AC current signal of fixed magnitude through the wafer portion is automatically determined. The voltage value provides a measure of wafer resistance.

Abstract: Apparatus for non-contact determination of wafer resistance of a semiconductor wafer includes a first sensor element, separated from a surface of the wafer by a first air gap, for capacitively coupling an AC drive signal into a portion of the wafer. A second sensor element, separated from the surface of the wafer by a second air gap, capacitively couples an AC output signal out of the wafer portion. An inductor, in series connection with the sensor elements is included in the sensor/wafer circuit. A frequency of the AC drive signal is automatically tuned to a resonant frequency at which capacitance impedance of the first air gap and of the second air gap is canceled by inductive impedance of the inductor. A voltage value of the drive signal required to drive an AC current signal of fixed magnitude through the wafer portion is automatically determined. The voltage value provides a measure of wafer resistance.