Abstract: A method for analyzing at least one bounded object in an electron microscope image that includes segmenting the image to provide a segmented image and measuring a dimension relative to the at least one bounded object in the segmented image. The electron microscope image can be an image of a semiconductor device that includes a pattern of bounded objects or structure of the semiconductor device.
Type:
Application
Filed:
August 3, 2022
Publication date:
February 9, 2023
Applicant:
Multiscale Technologies, Inc.
Inventors:
Srinivasa R Kalidindi, Hyung Nun Kim, Almambet Iskakov