Abstract: A device, a computer program, a computer readable medium and a method for controlling focus of a laser beam during a micro sweep are disclosed. The laser beam is received to an acousto-optic deflector, and acoustic waves are provided to the acousto-optic deflector. The acoustic waves are varied in frequency over time to vary a deflection angle of the laser beam over time thereby achieving the micro sweep of the laser beam. Furthermore, a rate of variation in frequency of the acoustic waves is adapted over a time of the micro sweep in such a way that differences in frequencies over the time of the micro sweep of the acoustic waves are caused in the acousto-optic deflector over a width of the laser beam in a direction parallel to the micro sweep when passing through the acousto-optic deflector, where the differences in frequencies over the time of the micro sweep are such that they cause a desired focus of the laser beam in a direction parallel with the micro sweep over the micro sweep.

Abstract: The present invention provides a mounting tool tip arranged for being releasably mounted to mounting tool of a component mounting machine, said mounting tool being rotatably arranged in said component mounting machine around a vertical rotational axis. The mounting tool tip comprises a tip portion at a first end and arranged for engagement with a component to be mounted in a component mounting machine; engagement means for mounting said mounting tool tip to said mounting tool. Further, the engagement means is arranged at a second end opposite said first end and further configured such that said tip portion is off-center in a horizontal direction compared to said rotational axis when the mounting tool tip is mounted to said mounting tool. The present invention further provides a mounting tool, a mount head, a component mounting machine as well as method for simultaneously picking at least two components arranged in adjacent component tapes in a component mounting machine.

Abstract: A microlithographic system, comprising: a climate chamber enclosing an atmosphere; a printing device for projection of an optical beam onto a photo-sensitive resist, the printing device being arranged in the climate chamber; a fluid reservoir arranged to accommodate a thermally conductive fluid and arranged to be in thermal connection with the atmosphere to transfer heat between the atmosphere and the thermally conductive fluid; a first heat exchanging means arranged outside the climate chamber; a means for transporting the thermally conductive fluid between the fluid reservoir and the first heat exchanging means; and a means for supplying a gas from outside the climate chamber to the enclosed atmosphere; wherein the first heat exchanging means is configured to transfer heat between the thermally conductive fluid and the gas before the gas is supplied to the enclosed atmosphere.

Abstract: A device configured to jet one or more droplets of a viscous medium may include a housing having an inner surface at least partially defining a jetting chamber configured to hold the viscous medium, and a flexible jetting nozzle. The flexible jetting nozzle may include a flexible conduit extending between an inlet orifice in an inner surface to an outlet orifice in an outer surface. The device may cause an increase of internal pressure of viscous medium in the jetting chamber to force one or more droplets of viscous medium through the flexible conduit and through the outlet orifice. The flexible jetting nozzle may include a flexible material. The flexible jetting nozzle may deform, to cause a cross-sectional area of the flexible conduit to dilate, in response to the increase of the internal pressure of the viscous medium in the jetting chamber.

Abstract: A method for obtaining line width compensating data for a workpiece patterning device comprises printing of a calibration pattern with an exposure beam that is sweepable in a sweep direction. The calibration pattern has a multitude of exposed and unexposed lines extending in the sweep direction having different line widths and different distances to neighboring lines. Line widths are measured. Deviations of the measured line widths are calculated. Based on the calculated deviations, line width compensating data is computed, intended for adapting line widths of pattern print data prior to printing to compensate for the calculated deviations. The line width compensating data is associated with at least an intended line width and information about whether the line is an exposed or unexposed line. A method for calibrating print data and a method for printing a pattern based thereon are also disclosed as well as systems therefore.

Abstract: The present invention provides a tape guide for guiding a component tape from a tape reel to a picking position of a component mounting machine. The tape guide comprises a support structure arranged for guiding the component tape from an upstream end portion of the tape guide to a downstream end portion of the tape guide. The tape guide further comprised a hook portion arranged at the downstream end portion and configured to grip a flange of said tape reel when the tape guide and tape reel are removed from said component mounting machine. The present invention further provides a unit comprising a tape guide, a tape reel and component tape as well as component mounting machine.

Abstract: A method for controlling an ejector is disclosed, wherein the ejector comprises an actuator arrangement configured to eject a droplet of viscous medium onto a substrate, and wherein the droplet forms part of a sequence of a plurality of droplets. The method comprises obtaining a control parameter for controlling the operation of the actuator arrangement, and operating the actuator arrangement, using the control parameter, in order to eject the droplet. The obtained control parameter is based on at least one of: a time period between the droplet and a previous droplet in the sequence, a difference in target size of the droplet and a size of the previous droplet in the sequence, and the droplets position in the sequence.

Abstract: A method for preparing pixel data for writing with SLM comprises obtaining (S10) of data representing a pattern. The data is rasterized (S20) to a grid of pixels. The rasterizing comprises assigning (S22) of an edge adjustment value to pixels covering an edge of the pattern. The rasterized pattern is divided (S30) into a number of rasterized pattern planes associated with a respective radiant exposure. The sum of radiant exposures for a completely covered pixel exceeds (S32) a threshold for activating a radiation sensitive layer on a substrate, onto which the pattern is to be printed. The sum of radiant exposures for a pattern edge pixel corresponds (S34) to a quantity sufficient to move a position of where the sum of radiant exposures reaches the activation threshold a distance that corresponds to the edge adjustment value. Data representing the rasterized pattern planes are outputted (S40).

Abstract: A method setting respective relative laser intensities to a plurality of pixels representing a lithographic exposure includes: decreasing a relative laser intensity of each pixel from a respective first relative laser intensity to a respective second relative laser intensity, adjusting a laser dose translation of relative laser intensity of pixels from a first laser dose translation of the first relative laser intensity to a second laser dose translation of the second relative laser intensity, such that a respective effective exposed laser dose of each pixel achieved by the second laser dose translation is equal to a respective effective exposed laser dose of each pixel that would have resulted from the first laser dose translation, and increasing, by a constant additive term, the respective relative laser intensity of an edge pixel or of a neighbouring pixel from the respective second relative laser intensity to a respective third relative laser intensity.

Abstract: A scanning lithographic laser writer, comprises a substrate holder, an irradiation arrangement and a control unit. The irradiation arrangement has a laser source, a multi head modulator arrangement and at least two writing head arrangements. The irradiation arrangement is arranged for providing laser light, via the multi head modulator arrangement to the writing head arrangements to irradiate a substrate plane. The control unit is configured for controlling a relative mechanical displacement between a substrate holder and the writing head arrangements, and for controlling a sweep of laser light exiting therefrom. The multi head modulator arrangement is configured to split and modulate an input beam into at least one modulated beam for each of the writing head arrangements by use of an acoustic-optical crystal. The writing head arrangements are positioned to displace laser light exiting from the writing head arrangements with respect to each other.

Abstract: A method of feeding a component tape towards a picking position of a component mounting machine is disclosed. The feeding is performed by means of a feeding mechanism configured to engage the component tape at an engaging position and to disengage the component tape at a disengaging position. The method comprises engaging the component tape at the engaging position, moving, by means of the feeding mechanism, the component tape from the engaging position to the disengaging position, disengaging the component tape at the disengaging position, and returning the feeding mechanism from the disengaging position to the engaging position and wherein the feeding mechanism moves the component tape in a linear motion between the engaging position and the disengaging position.

Abstract: An offset alignment method for a micro-lithographic printing device comprises placing (S10) of an alignment target substrate. A target pattern presents areas of at least two different light reflectivities is defined relative an origin point. The alignment target substrate is illuminated (S20). Reflected light is measured (S30). A reflection image of the target pattern is created (S40) by the measured light. The illumination is made according to a test pattern of light, having areas with and without illumination. The test pattern is defined relative an origin point. A measured target pattern origin point is determined (S50) from target pattern associated features in the reflection image and a measured test pattern origin point is determined from test patterns associated features in the reflection image. An offset between a measured position and a written position is calculated (S60) from the measured target pattern origin point and the measured test pattern origin point.

Abstract: Methods, a non-transitory computer-readable storage medium, devices, and a system in relation to training a convolutional neural network for deriving corrected digital pattern descriptions from digital pattern descriptions for use in a process for producing photomasks are disclosed. A reinforcement learning agent is trained to derive corrected digital pattern descriptions from respective digital pattern descriptions. The training is based on a first plurality of generated digital pattern descriptions and an obtained physical model using which predicted binary patterns of photomasks can be derived that would result from inputting digital pattern descriptions to the process for producing photomasks. A second plurality of digital pattern descriptions is then generated, and corresponding corrected digital pattern descriptions are generated using the trained reinforcement learning agent, thereby generating training data.

Abstract: A rasterization method of patterns with periodic components for SLMs is presented, comprising obtaining (S10) of an original pattern, having a periodicity. A first pattern main period is determined (S21). Image area and a first pitch of imaged elements are obtained (S31). The original pattern is scaled (S41) by a first raster scaling factor. The scaled pattern is cropped (S51) to comprise a first integer number of repetitions of the pattern items presenting a periodicity in the first direction that is covered by the image area, giving a rasterized pattern adapted to the intended pattern generator. The rasterized pattern is associated with data representing the first scaling factor. A writing method comprises obtaining of the rasterized pattern. Elements of the SLM in the pattern generator falling outside the rasterized pattern are set to be disabled. The rasterized pattern is written with an optical scaling to a target surface.

Abstract: A method for obtaining a compensation pattern for a workpiece patterning device comprises printing (S11) a calibration pattern with a plurality of simultaneously operating exposure beams being sweepable in a second direction according to calibration pattern print data having a multitude of edges. Positions of the edges are measured (S12). Deviations of the measured positions relative calibration pattern are calculated (S13). Each deviation is associated (S14) with a used exposure beam, with a sweep position and a grid fraction position. Edge compensating data is computed (S15) for adapting edge representations of pattern print data prior to printing to compensate for the calculated deviations. The edge compensating data is dependent on the used exposure beam, the sweep position, and the grid fraction position.

Abstract: The technology disclosed uses extreme beam shaping to increase the amount of energy projected through an AOD. First and second expanders and are described that are positioned before and after the AOD. In one implementation, the optical path shapes energy from a source, such as a Gaussian laser spot, deflects it, then reshapes it into a writing spot. In another implementation for image capture, rather than projection system, the disclosed optics reshape a reading spot from an imaged surface to a high-aspect ratio beam at an AOD exit, subject to deflection by the AOD. The optics reshape the radiation relayed by the high-aspect ratio beam through the AOD to a detector. Since light can travel in both directions through an optical system, the details described in terms of projecting a writing spot onto a radiation sensitive surface also apply to metrology sweeping a reading spot over an imaged surface.

Abstract: The present invention provides a tape guide for guiding a component tape from a tape reel to a picking position of a component mounting machine. The tape guide comprises a support structure arranged for guiding the component tape from an upstream end portion of the tape guide to a downstream end portion of the tape guide. The tape guide further comprised a hook portion arranged at the downstream end portion and configured to grip a flange of said tape reel when the tape guide and tape reel are removed from said component mounting machine. The present invention further provides a unit comprising a tape guide, a tape reel and component tape as well as component mounting machine.

Abstract: A holder arrangement for releasably holding a plurality of component feeders, configured to feed a component tape towards a picking position of a component mounting machine, is disclosed. The arrangement comprises a first mechanical interface configured to releasably attach the plurality of component feeders to the holder arrangement, and a second mechanical interface configured to releasably attach the holder arrangement to a component tape magazine configured to be loaded into the component mounting machine, such that the component feeders are positioned to guide the component tape to the picking position. Furthermore, a method for handling at least one component feeder, is disclosed.

Abstract: A method for obtaining a compensation pattern for a workpiece patterning device comprises printing (S11) a calibration pattern with a plurality of simultaneously operating exposure beams being sweepable in a second direction according to calibration pattern print data having a multitude of edges. Positions of the edges are measured (S12). Deviations of the measured positions relative calibration pattern are calculated (S13). Each deviation is associated (S14) with a used exposure beam, with a sweep position and a grid fraction position. Edge compensating data is computed (S15) for adapting edge representations of pattern print data prior to printing to compensate for the calculated deviations. The edge compensating data is dependent on the used exposure beam, the sweep position, and the grid fraction position.

Abstract: An offset alignment method for a micro-lithographic printing device comprises placing (S10) of an alignment target substrate. A target pattern presents areas of at least two different light reflectivities is defined relative an origin point. The alignment target substrate is illuminated (S20). Reflected light is measured (S30). A reflection image of the target pattern is created (S40) by the measured light. The illumination is made according to a test pattern of light, having areas with and without illumination. The test pattern is defined relative an origin point. A measured target pattern origin point is determined (S50) from target pattern associated features in the reflection image and a measured test pattern origin point is determined from test patterns associated features in the reflection image. An offset between a measured position and a written position is calculated (S60) from the measured target pattern origin point and the measured test pattern origin point.