Abstract: A method for preparing pixel data for writing with SLM comprises obtaining (S10) of data representing a pattern. The data is rasterized (S20) to a grid of pixels. The rasterizing comprises assigning (S22) of an edge adjustment value to pixels covering an edge of the pattern. The rasterized pattern is divided (S30) into a number of rasterized pattern planes associated with a respective radiant exposure. The sum of radiant exposures for a completely covered pixel exceeds (S32) a threshold for activating a radiation sensitive layer on a substrate, onto which the pattern is to be printed. The sum of radiant exposures for a pattern edge pixel corresponds (S34) to a quantity sufficient to move a position of where the sum of radiant exposures reaches the activation threshold a distance that corresponds to the edge adjustment value. Data representing the rasterized pattern planes are outputted (S40).

Abstract: A method setting respective relative laser intensities to a plurality of pixels representing a lithographic exposure includes: decreasing a relative laser intensity of each pixel from a respective first relative laser intensity to a respective second relative laser intensity, adjusting a laser dose translation of relative laser intensity of pixels from a first laser dose translation of the first relative laser intensity to a second laser dose translation of the second relative laser intensity, such that a respective effective exposed laser dose of each pixel achieved by the second laser dose translation is equal to a respective effective exposed laser dose of each pixel that would have resulted from the first laser dose translation, and increasing, by a constant additive term, the respective relative laser intensity of an edge pixel or of a neighbouring pixel from the respective second relative laser intensity to a respective third relative laser intensity.

Abstract: A scanning lithographic laser writer, comprises a substrate holder, an irradiation arrangement and a control unit. The irradiation arrangement has a laser source, a multi head modulator arrangement and at least two writing head arrangements. The irradiation arrangement is arranged for providing laser light, via the multi head modulator arrangement to the writing head arrangements to irradiate a substrate plane. The control unit is configured for controlling a relative mechanical displacement between a substrate holder and the writing head arrangements, and for controlling a sweep of laser light exiting therefrom. The multi head modulator arrangement is configured to split and modulate an input beam into at least one modulated beam for each of the writing head arrangements by use of an acoustic-optical crystal. The writing head arrangements are positioned to displace laser light exiting from the writing head arrangements with respect to each other.

Abstract: A method of feeding a component tape towards a picking position of a component mounting machine is disclosed. The feeding is performed by means of a feeding mechanism configured to engage the component tape at an engaging position and to disengage the component tape at a disengaging position. The method comprises engaging the component tape at the engaging position, moving, by means of the feeding mechanism, the component tape from the engaging position to the disengaging position, disengaging the component tape at the disengaging position, and returning the feeding mechanism from the disengaging position to the engaging position and wherein the feeding mechanism moves the component tape in a linear motion between the engaging position and the disengaging position.

Abstract: An offset alignment method for a micro-lithographic printing device comprises placing (S10) of an alignment target substrate. A target pattern presents areas of at least two different light reflectivities is defined relative an origin point. The alignment target substrate is illuminated (S20). Reflected light is measured (S30). A reflection image of the target pattern is created (S40) by the measured light. The illumination is made according to a test pattern of light, having areas with and without illumination. The test pattern is defined relative an origin point. A measured target pattern origin point is determined (S50) from target pattern associated features in the reflection image and a measured test pattern origin point is determined from test patterns associated features in the reflection image. An offset between a measured position and a written position is calculated (S60) from the measured target pattern origin point and the measured test pattern origin point.

Abstract: Methods, a non-transitory computer-readable storage medium, devices, and a system in relation to training a convolutional neural network for deriving corrected digital pattern descriptions from digital pattern descriptions for use in a process for producing photomasks are disclosed. A reinforcement learning agent is trained to derive corrected digital pattern descriptions from respective digital pattern descriptions. The training is based on a first plurality of generated digital pattern descriptions and an obtained physical model using which predicted binary patterns of photomasks can be derived that would result from inputting digital pattern descriptions to the process for producing photomasks. A second plurality of digital pattern descriptions is then generated, and corresponding corrected digital pattern descriptions are generated using the trained reinforcement learning agent, thereby generating training data.

Abstract: A rasterization method of patterns with periodic components for SLMs is presented, comprising obtaining (S10) of an original pattern, having a periodicity. A first pattern main period is determined (S21). Image area and a first pitch of imaged elements are obtained (S31). The original pattern is scaled (S41) by a first raster scaling factor. The scaled pattern is cropped (S51) to comprise a first integer number of repetitions of the pattern items presenting a periodicity in the first direction that is covered by the image area, giving a rasterized pattern adapted to the intended pattern generator. The rasterized pattern is associated with data representing the first scaling factor. A writing method comprises obtaining of the rasterized pattern. Elements of the SLM in the pattern generator falling outside the rasterized pattern are set to be disabled. The rasterized pattern is written with an optical scaling to a target surface.

Abstract: A method for obtaining a compensation pattern for a workpiece patterning device comprises printing (S11) a calibration pattern with a plurality of simultaneously operating exposure beams being sweepable in a second direction according to calibration pattern print data having a multitude of edges. Positions of the edges are measured (S12). Deviations of the measured positions relative calibration pattern are calculated (S13). Each deviation is associated (S14) with a used exposure beam, with a sweep position and a grid fraction position. Edge compensating data is computed (S15) for adapting edge representations of pattern print data prior to printing to compensate for the calculated deviations. The edge compensating data is dependent on the used exposure beam, the sweep position, and the grid fraction position.

Abstract: The technology disclosed uses extreme beam shaping to increase the amount of energy projected through an AOD. First and second expanders and are described that are positioned before and after the AOD. In one implementation, the optical path shapes energy from a source, such as a Gaussian laser spot, deflects it, then reshapes it into a writing spot. In another implementation for image capture, rather than projection system, the disclosed optics reshape a reading spot from an imaged surface to a high-aspect ratio beam at an AOD exit, subject to deflection by the AOD. The optics reshape the radiation relayed by the high-aspect ratio beam through the AOD to a detector. Since light can travel in both directions through an optical system, the details described in terms of projecting a writing spot onto a radiation sensitive surface also apply to metrology sweeping a reading spot over an imaged surface.

Abstract: The present invention provides a tape guide for guiding a component tape from a tape reel to a picking position of a component mounting machine. The tape guide comprises a support structure arranged for guiding the component tape from an upstream end portion of the tape guide to a downstream end portion of the tape guide. The tape guide further comprised a hook portion arranged at the downstream end portion and configured to grip a flange of said tape reel when the tape guide and tape reel are removed from said component mounting machine. The present invention further provides a unit comprising a tape guide, a tape reel and component tape as well as component mounting machine.

Abstract: A holder arrangement for releasably holding a plurality of component feeders, configured to feed a component tape towards a picking position of a component mounting machine, is disclosed. The arrangement comprises a first mechanical interface configured to releasably attach the plurality of component feeders to the holder arrangement, and a second mechanical interface configured to releasably attach the holder arrangement to a component tape magazine configured to be loaded into the component mounting machine, such that the component feeders are positioned to guide the component tape to the picking position. Furthermore, a method for handling at least one component feeder, is disclosed.

Abstract: A method for obtaining a compensation pattern for a workpiece patterning device comprises printing (S11) a calibration pattern with a plurality of simultaneously operating exposure beams being sweepable in a second direction according to calibration pattern print data having a multitude of edges. Positions of the edges are measured (S12). Deviations of the measured positions relative calibration pattern are calculated (S13). Each deviation is associated (S14) with a used exposure beam, with a sweep position and a grid fraction position. Edge compensating data is computed (S15) for adapting edge representations of pattern print data prior to printing to compensate for the calculated deviations. The edge compensating data is dependent on the used exposure beam, the sweep position, and the grid fraction position.

Abstract: An offset alignment method for a micro-lithographic printing device comprises placing (S10) of an alignment target substrate. A target pattern presents areas of at least two different light reflectivities is defined relative an origin point. The alignment target substrate is illuminated (S20). Reflected light is measured (S30). A reflection image of the target pattern is created (S40) by the measured light. The illumination is made according to a test pattern of light, having areas with and without illumination. The test pattern is defined relative an origin point. A measured target pattern origin point is determined (S50) from target pattern associated features in the reflection image and a measured test pattern origin point is determined from test patterns associated features in the reflection image. An offset between a measured position and a written position is calculated (S60) from the measured target pattern origin point and the measured test pattern origin point.

Abstract: A device, a computer program, a computer readable medium and a method setting respective relative laser intensities to a plurality of pixels representing a lithographic exposure. The plurality of pixels comprises at least one edge pixel arranged on an edge of an area of pixels to be exposed, and at least one neighbouring pixel. The at least one neighbouring pixel is arranged one pixel away from the at least one edge pixel in a perpendicular direction away from the edge towards the area of pixels to be exposed. The method comprises decreasing proportionally a relative laser intensity of each pixel of the plurality of pixels from a previously set respective first relative laser intensity to a respective second relative laser intensity. A laser dose translation of relative laser intensity of pixels proportionally adjusted from a previously set first laser dose translation of the first relative laser intensity to a second laser dose translation of the second relative laser intensity.

Abstract: A method for processing print data defining a pattern to be printed comprises obtaining (S10) of vector print data for the pattern to be printed. The vector print data is divided (S12) into vector print data of scan strips, wherein each scan strip is associated with a scan velocity. A skew transformation of the vector print data is performed (S14) in each scan strip. The skew transformation is performed in a direction opposite to respective scan velocity and with a magnitude proportional to a magnitude of the scan velocity. A method for printing a pattern, a device for processing print data and a printing device according to the same principles are also disclosed.

Abstract: A method, a system and an archive server for determining an illumination setting for capturing an image of a component, belonging to a specific package type, in a pick-and-place machine are provided. The method comprises capturing a first image of a first component of the specific package type while the first component is illuminated by a first illumination component, and capturing a second image of the first component while the first component is illuminated by a second illumination component, the second illumination component being different from the first illumination component. An illumination setting may then be determined by creating a plurality of generated images based on the first and second image of the first component, and selecting the generated image that fulfils a predetermined quality measure.

Abstract: The present invention provides a component mounting machine -comprising a picking tool for picking electronic components from a source of electronic components and placing them onto a workpiece, a verification unit for measuring an electrical property of an electronic component picked and held by the picking tool. The verification unit comprises a board, a plurality of test electrodes arranged on a surface of said board and a system for measuring an output signal from the test electrodes upon contact between a picked electronic component and at least two of said test electrodes. Further, at least one test electrode arranged on a flexible portion of the board that is configured to flex upon engagement between a picked electronic component and said at least two test electrodes.

Abstract: A device, a computer program, a computer readable medium and a method for controlling focus of a laser beam during a micro sweep are disclosed. The laser beam is received to an acousto-optic deflector, and acoustic waves are provided to the acousto-optic deflector. The acoustic waves are varied in frequency over time to vary a deflection angle of the laser beam over time thereby achieving the micro sweep of the laser beam. Furthermore, a rate of variation in frequency of the acoustic waves is adapted over a time of the micro sweep in such a way that differences in frequencies over the time of the micro sweep of the acoustic waves are caused in the acousto-optic deflector over a width of the laser beam in a direction parallel to the micro sweep when passing through the acousto-optic deflector, where the differences in frequencies over the time of the micro sweep are such that they cause a desired focus of the laser beam in a direction parallel with the micro sweep over the micro sweep.

Abstract: A method for mounting a component (100) on a workpiece (106), the method comprising obtaining information regarding a surface topography of at least one of a mounting surface (102) of the component and a local surface (108) of the workpiece onto which the component is to be mounted. The method further comprises forming a plurality of deposits (110) of a viscous medium on at least one of the mounting and local surfaces, wherein each of the plurality of deposits has a height (/½, /½, h3) based on the obtained information, and is formed by individually applying at least one droplet (234) of the viscous medium (232) using non-contact dispensing. The method further comprises placing the component on the substrate, such that the plurality of deposits of viscous medium forms a connection between the component and the workpiece.

Abstract: A rasterization method of patterns with periodic components for SLMs is presented, comprising obtaining (S10) of an original pattern, having a periodicity. A first pattern main period is determined (S21). Image area and a first pitch of imaged elements are obtained (S31). The original pattern is scaled (S41) by a first raster scaling factor. The scaled pattern is cropped (S51) to comprise a first integer number of repetitions of the pattern items presenting a periodicity in the first direction that is covered by the image area, giving a rasterized pattern adapted to the intended pattern generator. The rasterized pattern is associated with data representing the first scaling factor. A writing method comprises obtaining of the rasterized pattern. Elements of the SLM in the pattern generator falling outside the rasterized pattern are set to be disabled. The rasterized pattern is written with an optical scaling to a target surface.