Abstract: The present invention provides a new filter cleaning method that has cleaning performance superior to that of ultrasonic cleaning. The method for cleaning a filter of the present invention includes the steps of: generating a shock wave; and bringing the shock wave into contact with a filter to which a filler adhered, wherein in the shock wave contacting step, a pressure applied to the filter by the shock wave is 0.07 MPa or more.
Type:
Grant
Filed:
December 12, 2018
Date of Patent:
January 11, 2022
Assignees:
Nagase Filter Co, Ltd., National University Corporation Kumamoto University