Patents Assigned to Nagase Kasei Kogyo Kabushiki Kaisha
  • Photoresist composition
    Patent number: 4575480
    Abstract: A positive photoresist composition in the form of solution which comprises a resin soluble in an aqueous alkaline solution, a 1,2-quinonediazide derivative as a photosensitizer, and at least one anti-halation agent in amounts of about 1 to about 10 parts by weight in relation to 100 parts by weight of the resin in the composition, the anti-halation agent being selected from the group consisting of dyestuffs of specific structures.
    Type: Grant
    Filed: October 22, 1984
    Date of Patent: March 11, 1986
    Assignee: Nagase Kasei Kogyo Kabushiki Kaisha
    Inventors: Takeshi Kotani, Yoshiaki Horiuchi, Yoichi Kamata