Abstract: An observation and photography apparatus that has a polishing mechanism attached thereto. The polishing mechanism is provided with a turntable with a perpendicular rotation shaft, a polishing cloth for polishing the surface of a sample attached to the bottom surface of the turntable, and a polishing-fluid spraying nozzle disposed below the polishing cloth for spraying polishing fluid containing polishing material upward to we the polishing cloth.
Type:
Grant
Filed:
June 18, 2013
Date of Patent:
October 31, 2017
Assignees:
KAGOSHIMA UNIVERSITY, NATIONAL UNIVERSITY CORPORATION, NAKAYAMADENKI CO., LTD.
Abstract: An observation and photography apparatus that has a polishing mechanism attached thereto. The polishing mechanism is provided with a turntable with a perpendicular rotation shaft, a polishing cloth for polishing the surface of a sample attached to the bottom surface of the turntable, and a polishing-fluid spraying nozzle disposed below the polishing cloth for spraying polishing fluid containing polishing material upward to we the polishing cloth.
Type:
Application
Filed:
June 18, 2013
Publication date:
July 2, 2015
Applicants:
Kagoshima University, National University Corporation, Nakayamadenki Co., Ltd.