Patents Assigned to Nalux Co., Ltd.
  • Patent number: 9861996
    Abstract: A deposition apparatus includes a deposition source; a rotatable dome provided with an opening which covers the source; a first lever provided outside of the dome; and a tray holder including a frame including a first rotating member and a rotating part including a second rotating member and being attached to the frame such that the rotating part rotates with the second rotating member around an axis supported by the frame. The rotating part includes work-holding trays arranged around the axis, the tray holder is installed on the dome such that a side of one of the trays covers the opening, the first rotating member is rotated by the first lever during rotation of the dome, and the second rotating member is rotated with the rotating part by the first rotating member so as to change the tray a side of which covers the opening to another one.
    Type: Grant
    Filed: February 12, 2015
    Date of Patent: January 9, 2018
    Assignee: NALUX CO., LTD.
    Inventors: Toshiro Higuchi, Hiroshi Ueno, Hitoshi Kimura
  • Patent number: 9857051
    Abstract: An optical element is provided. When in a xz cross section, an angle which a ray travelling from the origin at ?r forms with the normal to the light receiving surface is designated as ?x, an angle which a ray travelling from b in the z axis direction forms, after the surface, with the z axis direction is designated as ?ib, in a yz cross section, an angle which a ray travelling from the origin at ?r forms with the normal to the light receiving surface is designated as ?y, angles which a ray travelling from a in the z axis direction forms, after the light receiving and exiting surfaces, with the z axis direction are designated as ?ia and ?ea, and an angle which a ray travelling from the origin at arctan(a/ha) forms, after the light exiting surface, with the z axis direction is designated as ?eha, ?y>?x (0<?r<60°) ?eha>45° ?ea>45° ?ia>?ib are satisfied.
    Type: Grant
    Filed: June 9, 2014
    Date of Patent: January 2, 2018
    Assignee: NALUX CO., LTD.
    Inventors: Katsumoto Ikeda, Daisuke Seki
  • Patent number: 9618660
    Abstract: An infrared imaging system used for infrared rays of wavelength of 5 micrometers or greater, the system including, from the object side to the image side, an aperture, a lens made of synthetic resin and an imaging element, the object side surface of the lens being convex to the object side in the paraxial area, wherein F-number of the system is 1.4 or smaller.
    Type: Grant
    Filed: February 13, 2015
    Date of Patent: April 11, 2017
    Assignees: NALUX CO., LTD., FLIR Systems, Inc.
    Inventors: Kayoko Fujimura, Katsumoto Ikeda, Daisuke Seki
  • Patent number: 9551866
    Abstract: In an optical scanning system, each of plural light beams is reflected at a point on a deflector in a sub-scanning cross section, a point of reflection on the deflector of the principal ray of each beam in the case that the principal ray is incident normally to a scanning surface in a main scanning cross section is designated as a fiducial point, distance from the fiducial point to the scanning surface is designated as L, distance from the center of curvature of the exit surface of one of the second scanning lenses for a light beam i to the scanning surface is designated as BFi, refractive powers of the first scanning lens and one of the second scanning lenses are designated as ?1si and ?2si, and then the following expressions are satisfied. 0.15?BFi/L?0.2??(1) 0.
    Type: Grant
    Filed: April 27, 2016
    Date of Patent: January 24, 2017
    Assignee: NALUX CO., LTD.
    Inventor: Tomohito Kuwagaito
  • Patent number: 9547171
    Abstract: An optical scanning system includes a variable-focus element, an imaging lens and a deflector, wherein the reciprocal of the focal length f of the variable-focus element is changed from 1/fMIN to 1/fMAX, and for the case that the equation 1/f={(1/fMAX)+(1/fMIN)}/2 holds, a beam which has passed through the variable-focus element is a divergent beam, and x 2 + x 2 2 x 1 > x 3 ( 1 ) is satisfied, where x1 represents a distance from a virtual image point of the divergent beam to the principal point on the entry side of the variable-focus element, x2 represents a distance from the principal point on the exit side of the variable-focus element to the principal point on the entry side of the imaging lens, and x3 represents a distance from the principal point on the exit side of the imaging lens to an image point.
    Type: Grant
    Filed: October 1, 2015
    Date of Patent: January 17, 2017
    Assignee: NALUX CO., LTD.
    Inventors: Daisuke Seki, Takatoshi Suzuki, Tomohito Kuwagaito
  • Patent number: 9459388
    Abstract: A multi-layered optical film formed on a plastic substrate, which has high resistance against lights in the ultraviolet region including blue lasers in a high ambient temperature is disclosed. Each layer of the multi-layered optical film is made of an oxide or an oxynitride, layers adjacent to each other are made of materials having different refractive indexes, oxidation-reduction potential of elements constituting oxides or oxynitrides is ?0.9 volts or less, thickness of a first layer adjacent to the substrate is 10 nanometers or more, an absolute value of a difference in refractive index between a material of the substrate and a material of the first layer is 0.2 or less, an absolute value of a difference in refractive index between two kinds of materials of layers adjacent to each other is 0.45 or less and total thickness of the multi-layered optical film is 3000 nanometers or less.
    Type: Grant
    Filed: October 11, 2012
    Date of Patent: October 4, 2016
    Assignee: NALUX CO., LTD.
    Inventors: Hiroaki Uefuji, Yasuaki Inoue
  • Patent number: 9435507
    Abstract: An optical element has a light receiving surface covering a light source arranged on a plane and an exit surface covering the light receiving surface. When an axis passing through the center of the light source and is perpendicular to the plane is designated as an optical axis and the point of intersection of the optical axis and the light receiving surface is designated as O1, the light receiving surface is concaved around the optical axis with respect to the periphery. When an angle which a normal to the light receiving surface on a point P thereon forms with the optical axis is designated as ?h and distance in the optical axis direction from O1 to P is designated as z, ?h has at least one local maximum value and at least one local minimum value with respect to z while P is moved along the light receiving surface.
    Type: Grant
    Filed: October 14, 2014
    Date of Patent: September 6, 2016
    Assignee: NALUX CO., LTD.
    Inventors: Katsumoto Ikeda, Daisuke Seki, Kouei Hatade
  • Patent number: 9404638
    Abstract: An optical element according to the present invention includes a light receiving surface which is designed to cover an emitting surface of a planar light source device, a reflecting surface, a light exit surface which is contiguous to the periphery of the reflecting surface. When the center of the emitting surface is designated as a point O and an axis which passes through the point O and is perpendicular to the emitting surface is designated as an optical axis of the optical element, the reflecting surface has a concave portion around the optical axis and an outer edge surrounding the concave portion.
    Type: Grant
    Filed: September 24, 2013
    Date of Patent: August 2, 2016
    Assignee: NALUX CO., LTD.
    Inventors: Daisuke Seki, Katsumoto Ikeda
  • Patent number: 9285092
    Abstract: A projector type headlight can include a projection lens arranged on an optical axis extending in a longitudinal direction of a vehicle, and a light source unit arranged on a more rear side than a back side focal plane of the projection lens, the projection lens including resin lenses which are arranged on the optical axis. A resin lens out of the resin lenses arranged closer to the light source unit includes a diffraction grating provided on a lens face in a side opposite to a light source, the resin lens out of the resin lenses arranged closer to the light source unit has a lens face having a positive power, which is arranged in a light source side, and the diffraction grating is designed so as to cancel chromatic aberration of light emitted from the light source unit and emitted forward through the resin lenses.
    Type: Grant
    Filed: July 24, 2013
    Date of Patent: March 15, 2016
    Assignees: Stanley Electric Co., Ltd., NALUX CO., LTD.
    Inventors: Toshimichi Anzai, Yoshiaki Nakaya, Norihisa Sakagami
  • Patent number: 9200777
    Abstract: An illumination device for planar light sources gives uniform illumination on an illuminated plane. A of lengthwise direction and length of breadthwise direction are different from each other. The illumination device includes a planar light source and an optical element including a light receiving surface for receiving light form the planar light source and a light exiting surface. A shape of the planar light source is symmetric with respect to x-axis and y-axis and a length of the shape in x-axis direction is shorter than length of the shape in y-axis direction; the center of the planar light source is set as the origin and two axes orthogonal to each other are selected as x-axis and y-axis. Assuming that the maximum value of x-coordinate of the planar light source is a and the maximum value of y-coordinate of the planar light source is b, the following relationships hold: h ab = ( h a + a ) - ( h b + b ) ( h a + a ) h ab ? 0.02 .
    Type: Grant
    Filed: November 7, 2012
    Date of Patent: December 1, 2015
    Assignee: NALUX CO., LTD.
    Inventors: Katsumoto Ikeda, Daisuke Seki
  • Patent number: 9194559
    Abstract: An illumination lens includes a light receiving surface 101; and a light exit surface 103. When the axis of 101 is designated as Z-axis, a position of the bottom of the lens is designated as z=0 and X-axis and Y-axis are defined in a plane which contains z=0 and is perpendicular to Z-axis, 101 is symmetric about YZ-plane and XZ-plane and a cross-sectional area of a cross section of 101 parallel to XY-plane monotonously decreases with increase in z-coordinate. When the maximum value of z-coordinate on 101 is designated as d and a radius of the cross section of 103 at z=0 is designated as r, a point (x, y) on a cross section of 101 at z=0.3d is represented by ( x a ) 2 + ( y b ) 2 = f ? ( ? ) ? ? 0 ? ? ? ? 2 ( 1 ) where a and b represent constants and ? = tan - 1 ? ( y x ) ? ? f ? ( 0 ) = f ? ( ? 2 ) = 1.0 , ? and ? ? f ? ( ? ) ? 1.
    Type: Grant
    Filed: September 24, 2013
    Date of Patent: November 24, 2015
    Assignee: NALUX CO., LTD.
    Inventors: Daisuke Seki, Katsumoto Ikeda, Takatoshi Suzuki
  • Patent number: 9042024
    Abstract: The method includes the steps of: obtaining lateral magnification of an optical scanning system; obtaining the maximum value of thickness in the optical axis direction of an scanner lens; obtaining allowance b on one side and beam diameter a in the vertical scanning direction in the lens; and obtaining width h in the vertical scanning direction of the lens by the following expression h=a+2b. The allowance b is a product of the maximum value of thickness in the optical axis direction of the lens and a coefficient, and the coefficient is determined according to the lateral magnification of the system in such a way that the maximum value of movement of the focal point of the lens due to moisture absorption is made smaller than or equal to a predetermined value.
    Type: Grant
    Filed: March 28, 2013
    Date of Patent: May 26, 2015
    Assignee: NALUX CO., LTD.
    Inventors: Tomohito Kuwagaito, Yosuke Sakohira, Daisuke Seki
  • Patent number: 8974086
    Abstract: A lens used for a line generating optical system is provided, wherein X-axis is defined in longitudinal direction of the generated line, Y-axis is defined in width direction and Z-axis is defined in direction of the optical axis and wherein the lens has an optical surface which does not collimate the light in X-axis direction and which collimates or collects the light in Y-axis direction alone, inclination of direction of transferred tool mark with respect to X-axis being from 40 to 50 degrees in an area of 80% or more of the optical surface.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: March 10, 2015
    Assignee: Nalux Co., Ltd.
    Inventor: Masafumi Seigo
  • Publication number: 20140063801
    Abstract: An illumination lens includes a light receiving surface 101; and a light exit surface 103. When the axis of 101 is designated as Z-axis, a position of the bottom of the lens is designated as z=0 and X-axis and Y-axis are defined in a plane which contains z=0 and is perpendicular to Z-axis, 101 is symmetric about YZ-plane and XZ-plane and a cross-sectional area of a cross section of 101 parallel to XY-plane monotonously decreases with increase in z-coordinate. When the maximum value of z-coordinate on 101 is designated as d and a radius of the cross section of 103 at z=0 is designated as r, a point (x, y) on a cross section of 101 at z=0.3 d is represented by ( x a ) 2 + ( y b ) 2 = f ? ( ? ) ? ? 0 ? ? ? ? 2 ( 1 ) where a and b represent constants and ? = tan - 1 ? ( y x ) ? ? f ? ( 0 ) = f ? ( ? 2 ) = 1.0 , ? and ? ? f ? ( ? ) ? 1.
    Type: Application
    Filed: September 24, 2013
    Publication date: March 6, 2014
    Applicant: NALUX CO., LTD.
    Inventors: Daisuke SEKI, Katsumoto IKEDA, Takatoshi SUZUKI
  • Publication number: 20140063816
    Abstract: An optical element according to the present invention includes a light receiving surface which is designed to cover an emitting surface of a planar light source device, a reflecting surface, a light exit surface which is contiguous to the periphery of the reflecting surface. When the center of the emitting surface is designated as a point O and an axis which passes through the point O and is perpendicular to the emitting surface is designated as an optical axis of the optical element, the reflecting surface has a concave portion around the optical axis and an outer edge surrounding the concave portion.
    Type: Application
    Filed: September 24, 2013
    Publication date: March 6, 2014
    Applicant: NALUX CO., LTD.
    Inventors: Daisuke SEKI, Katsumoto IKEDA
  • Patent number: 8649096
    Abstract: This invention provides a mold with which a two-dimensional subwavelength grating can be produced with a higher percentage transfer by injection molding and a two-dimensional subwavelength grating having a high aspect ratio produced with such a mold. The mold for a fine grating according to the present invention has protrusion parts (107) arranged at an interval on the bottom face (103) of a cavity, wherein the interval is a distance between centers of the protrusion parts and a period of the fine grating smaller than wavelengths of visible lights. In one embodiment, a cross-section of the protrusion parts, parallel to the bottom face of the cavity decreases with height along the protrusion parts and a decreasing rate of the cross-section increases with height along the protrusions.
    Type: Grant
    Filed: May 22, 2006
    Date of Patent: February 11, 2014
    Assignee: Nalux Co., Ltd.
    Inventors: Kazuya Yamamoto, Makoto Okada
  • Publication number: 20140029287
    Abstract: A projector type headlight can include a projection lens arranged on an optical axis extending in a longitudinal direction of a vehicle, and a light source unit arranged on a more rear side than a back side focal plane of the projection lens, the projection lens including resin lenses which are arranged on the optical axis. A resin lens out of the resin lenses arranged closer to the light source unit includes a diffraction grating provided on a lens face in a side opposite to a light source, the resin lens out of the resin lenses arranged closer to the light source unit has a lens face having a positive power, which is arranged in a light source side, and the diffraction grating is designed so as to cancel chromatic aberration of light emitted from the light source unit and emitted forward through the resin lenses.
    Type: Application
    Filed: July 24, 2013
    Publication date: January 30, 2014
    Applicants: NALUX CO., LTD., Stanley Electric Co., Ltd.
    Inventors: Toshimichi Anzai, Yoshiaki Nakaya, Norihisa Sakagami
  • Publication number: 20130258489
    Abstract: The method includes the steps of: obtaining lateral magnification of an optical scanning system; obtaining the maximum value of thickness in the optical axis direction of an scanner lens; obtaining allowance b on one side and beam diameter a in the vertical scanning direction in the lens; and obtaining width h in the vertical scanning direction of the lens by the following expression h=a+2b. The allowance b is a product of the maximum value of thickness in the optical axis direction of the lens and a coefficient, and the coefficient is determined according to the lateral magnification of the system in such a way that the maximum value of movement of the focal point of the lens due to moisture absorption is made smaller than or equal to a predetermined value.
    Type: Application
    Filed: March 28, 2013
    Publication date: October 3, 2013
    Applicant: NALUX CO., LTD.
    Inventors: Tomohito KUWAGAITO, Yosuke SAKOHIRA, Daisuke SEKI
  • Patent number: 8514482
    Abstract: A terahertz electromagnetic wave generating element can include a generation layer, and a plurality of pairs of layer structures provided on opposite sides thereof. The layer structures are each provided with a first layer, a second layer on the side of the first layer opposite to the generation layer, and a first grating and a second grating, and having a grating period smaller than the wavelength of the terahertz electromagnetic wave to be used. The first and second gratings are configured so that the refractive index of a medium between the first layer and the second layer continuously varies between a first refractive index and a second refractive index. The thickness of the first and second layers and the grating period, and the grating height are determined so that a terahertz electromagnetic wave having a desired bandwidth with respect to a central wavelength of the terahertz electromagnetic wave generated by the generation layer can be generated.
    Type: Grant
    Filed: October 13, 2011
    Date of Patent: August 20, 2013
    Assignee: Nalux Co., Ltd.
    Inventor: Masato Okano
  • Publication number: 20130176615
    Abstract: A multi-layered optical film formed on a plastic substrate, which has high resistance against lights in the ultraviolet region including blue lasers in a high ambient temperature is disclosed. Each layer of the multi-layered optical film is made of an oxide or an oxynitride, layers adjacent to each other are made of materials having different refractive indexes, oxidation-reduction potential of elements constituting oxides or oxynitrides is ?0.9 volts or less, thickness of a first layer adjacent to the substrate is 10 nanometers or more, an absolute value of a difference in refractive index between a material of the substrate and a material of the first layer is 0.2 or less, an absolute value of a difference in refractive index between two kinds of materials of layers adjacent to each other is 0.45 or less and total thickness of the multi-layered optical film is 3000 nanometers or less.
    Type: Application
    Filed: October 11, 2012
    Publication date: July 11, 2013
    Applicant: NALUX CO., LTD.
    Inventor: NALUX CO., LTD.