Abstract: An air-bearing chuck includes a nozzle portion and a gas channel portion. The nozzle portion is provided with a plurality of support force nozzles for generating an air cushion on a top surface of the nozzle portion. The gas channel portion includes a first gas channel configured to transmit a first gas to the plurality of support force nozzles to provide support force. Embodiments of the present application can implement that the first gas channel transmits the first gas to the plurality of support force nozzles to provide support force, and an air cushion is generated on the top surface of the nozzle portion by regulating gas flow of the first gas in the first gas channel, thereby keeping a supported object supported by the air cushion stably floating up on one side, away from the top surface of the nozzle portion, of the air cushion.

Abstract: Embodiments of the present application provide a measuring apparatus and method of a wafer geometry. The measuring apparatus of the wafer geometry includes: an air-bearing chuck, configured to generate an air cushion to keep a wafer to be measured floating up on a top surface of the air-bearing chuck; and an interferometer, disposed on one side, away from the air-bearing chuck, of the wafer, and configured to obtain an interference fringe image of a front surface of the wafer to measure a geometry of the wafer based on the interference fringe image. An air cushion is generated by utilizing an air-bearing chuck to keep a wafer to be measured floating up on a top surface of the air-bearing chuck, thereby avoiding damage of the original shape of the wafer or contamination of the wafer by a clamping tool, and further reducing errors during measurement.

Abstract: A semiconductor equipment architecture WGT for wafer shape and flatness measurement is disclosed. The semiconductor equipment architecture WGT includes a reflective air-bearing chuck and a hybrid wafer thickness gauge. Also disclosed are the corresponding methods of measuring wafer shape and flatness using the architecture, the air-bearing chuck and the hybrid wafer thickness gauge.

Abstract: A semiconductor equipment architecture WGT for wafer shape and flatness measurement is disclosed. The semiconductor equipment architecture WGT includes a reflective air-bearing chuck and a hybrid wafer thickness gauge. Also disclosed are the corresponding methods of measuring wafer shape and flatness using the architecture, the air-bearing chuck and the hybrid wafer thickness gauge.