Patents Assigned to Nano Pass Technologies Ltd.
  • Patent number: 7998119
    Abstract: A system and method for delivering fluid into a flexible biological barrier employs a microneedle structure wherein a final position of microneedles inserted into the biological barrier is generally sideways projecting from the delivery configuration instead of the conventional downwards projecting arrangement. The microneedles project from a relief surface which is distinct from a primary biological-barrier contact region of the delivery configuration, and is typically angled upwards away from the biological barrier. During insertion, the contact region is brought into contact with the biological barrier and moved parallel to the surface of the flexible biological barrier so as to generate a boundary between a stretched portion and a non-stretched portion of the barrier.
    Type: Grant
    Filed: May 23, 2005
    Date of Patent: August 16, 2011
    Assignee: Nano Pass Technologies Ltd.
    Inventors: Yehoshua Yeshurun, Meir Hefetz, Yoel Sefi, Yotam Levin, Gilad Lavi
  • Patent number: 7588552
    Abstract: A device (10) and method for transporting fluids across biological barriers enhances penetration of a biological barrier by the use of directional insertion, preferably with asymmetric microneedles (18) and/or microneedles (18) with sharp edges. Additionally, or alternatively, adhesion followed by alteration of contact geometry is employed to stretch the biological barrier across the microneedles (18), thereby also enhancing penetration. Also disclosed is a device (10) and method which combine shallow penetration by hollow microneedles (18) with jet injection via the microneedles (18) to achieve a total liquid penetration depth greater than the mechanical penetration depth of the microneedles (18).
    Type: Grant
    Filed: March 4, 2003
    Date of Patent: September 15, 2009
    Assignee: Nano Pass Technologies Ltd.
    Inventors: Yehoshua Yeshurun, Meir Hefetz, Gil Fruchtman, Yotam Levin
  • Publication number: 20060051404
    Abstract: A microstructure for transferring a substance through the surface of the skin, comprising a substrate having a first and a second side and at least one microstructure projecting from the second side of the substrate. The micrstructure has at least one hollow. The hollow is isolated from the fluid connection with the first side of the substrate. The hollow is configured such that, when the microstructure is inserted through the surface of the skin, at least part of the substance is transferred through the surface of the skin in the hollow.
    Type: Application
    Filed: November 18, 2003
    Publication date: March 9, 2006
    Applicant: NANO PASS TECHNOLOGIES LTD.
    Inventors: Yehoshua Yeshurun, Meir Hefetz, Gil Fruchtman, Yoel Sefi, Yotam Levine
  • Patent number: 6924087
    Abstract: A method for producing microneedles. The method including disposing a first layer of a radiation sensitive polymer on to a working surface and selectively irradiating the first layer such that the first layer has at least one irradiated region and at least one non-irradiated region. The method also including developing the first layer so as to selectively remove one of the at least one irradiated region and the at least one non-irradiated region such that, at least part of at least one remaining region at least partially defines a form of at least part of a microneedle structure. A microneedle structure including a plurality of microneedles at least partially formed from a radiation sensitive polymer.
    Type: Grant
    Filed: March 27, 2003
    Date of Patent: August 2, 2005
    Assignee: Nano Pass Technologies Ltd.
    Inventors: Yehoshua Yeshurun, Meir Hefetz, Erwin Berenschot, Meint de Boer, Dominique Maria Altpeter, Garrit Boom
  • Publication number: 20040072105
    Abstract: A method for producing microneedles. The method including disposing a first layer of a radiation sensitive polymer on to a working surface and selectively irradiating the first layer such that the first layer has at least one irradiated region and at least one non-irradiated region. The method also including developing the first layer so as to selectively remove one of the at least one irradiated region and the at least one non-irradiated region such that, at least part of at least one remaining region at least partially defines a form of at least part of a microneedle structure. A microneedle structure including a plurality of microneedles at least partially formed from a radiation sensitive polymer.
    Type: Application
    Filed: March 27, 2003
    Publication date: April 15, 2004
    Applicant: Nano Pass Technologies Ltd.
    Inventors: Yehoshua Yeshurun, Meir Hefetz, Erwin Berenschot, Meint de Boer, Dominique Maria Altpeter, Gerrit Boom