Abstract: In the embodiment a charged particle beam system includes a main chamber, an exchange chamber, an x-y positioning stage housed in the main chamber, a substrate-supporting structure supported by or provided by said stage and moveable in first and second perpendicular directions of travel between limits which define a field of travel and a substrate handling device housed inside the main chamber for loading and unloading a substrate into and out of the main chamber, the device comprising a bar and a side member for supporting the substance to one side of the bar. A method of loading a substrate in a charged particle beam system is also disclosed.

Abstract: An electron gun (1) includes an emitter (2), a tubular support (3) and an adaptor (4) for receiving the emitter. The adaptor includes a tapered plugging surface (7) and the tubular support includes a correspondingly tapered seating surface (9) for receiving the plugging surface. The plugging surface and seating surface have conical profiles which help to position the adaptor concentrically with the support.

Abstract: A beam blanking unit (1) comprises first and second blanking plates (2, 3) mounted to a support plate (15). A stopper (4) is mechanically and electrically connected to the first blanking plate (2).

Abstract: An electron beam lithography system includes a main chamber (4) and the exchange chamber (5) connected by a gate valve (7). A robot (15) is used to transfer a chuck (8) carrying a semiconductor wafer between a cassette (10) and laser interferometer mirror assembly (13). The robot includes a bar (17) and a side member (18) extending laterally from the bar for supporting the chuck.