Patents Assigned to NanoGram Corporation
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Patent number: 9475695Abstract: Silicon based nanoparticle inks are formulated with viscous polycyclic alcohols to control the rheology of the inks. The inks can be formulated into pastes with non-Newtonian rheology and good screen printing properties. The inks can have low metal contamination such that they are suitable for forming semiconductor structures. The silicon based nanoparticles can be elemental silicon particles with or without dopant.Type: GrantFiled: May 20, 2014Date of Patent: October 25, 2016Assignee: NanoGram CorporationInventors: Weidong Li, Masaya Soeda, Gina Elizabeth Pengra-Leung, Shivkumar Chiruvolu
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Patent number: 9448331Abstract: Polymer-inorganic particle blends are incorporated into structures generally involving interfaces with additional materials that can be used advantageously for forming desirable devices. In some embodiments, the structures are optical structures, and the interfaces are optical interfaces. The different materials at the interface can have differences in index-of-refraction to yield desired optical properties at the interface. In some embodiments, structures are formed with periodic variations in index-of-refraction. In particular, photonic crystals can be formed. Suitable methods can be used to form the desired structures.Type: GrantFiled: March 2, 2015Date of Patent: September 20, 2016Assignee: NanoGram CorporationInventors: Nobuyuki Kambe, Shivkumar Chiruvolu
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Patent number: 9378957Abstract: The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.Type: GrantFiled: February 14, 2014Date of Patent: June 28, 2016Assignee: NanoGram CorporationInventors: Guojun Liu, Uma Srinivasan, Shivkumar Chiruvolu
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Patent number: 9343606Abstract: Photovoltaic modules comprise solar cells having doped domains of opposite polarities along the rear side of the cells. The doped domains can be located within openings through a dielectric passivation layer. In some embodiments, the solar cells are formed from thin silicon foils. Doped domains can be formed by printing inks along the rear surface of the semiconducting sheets. The dopant inks can comprise nanoparticles having the desired dopant.Type: GrantFiled: October 31, 2012Date of Patent: May 17, 2016Assignee: NanoGram CorporationInventor: Henry Hieslmair
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Patent number: 9199435Abstract: Inorganic particle/polymer composites are described that involve chemical bonding between the elements of the composite. In some embodiments, the composite composition includes a polymer having side groups chemically bonded to inorganic particles. Furthermore, the composite composition can include chemically bonded inorganic particles and ordered copolymers. Various electrical, optical and electro-optical devices can be formed from the composites.Type: GrantFiled: September 14, 2012Date of Patent: December 1, 2015Assignee: NanoGram CorporationInventors: Nobuyuki Kambe, Shivkumar Chiruvol
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Patent number: 9175174Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.Type: GrantFiled: October 28, 2013Date of Patent: November 3, 2015Assignee: NanoGram CorporationInventor: Nobuyuki Kambe
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Patent number: 9163308Abstract: Light reactive deposition uses an intense light beam to form particles that are directly coated onto a substrate surface. In some embodiments, a coating apparatus comprising a noncircular reactant inlet, optical elements forming a light path, a first substrate, and a motor connected to the apparatus. The reactant inlet defines a reactant stream path. The light path intersects the reactant stream path at a reaction zone with a product stream path continuing from the reaction zone. The substrate intersects the product stream path. Also, operation of the motor moves the first substrate relative to the product stream. Various broad methods are described for using light driven chemical reactions to produce efficiently highly uniform coatings.Type: GrantFiled: July 30, 2009Date of Patent: October 20, 2015Assignee: NanoGram CorporationInventors: Xiangxin Bi, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, James T. Gardner, Seung M. Lim, William E. McGovern
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Patent number: 9006720Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.Type: GrantFiled: April 8, 2013Date of Patent: April 14, 2015Assignee: NanoGram CorporationInventors: Shivkumar Chiruvolu, Igor Altman, Bernard M. Frey, Weidong Li, Guojun Liu, Robert B. Lynch, Gina Elizabeth Pengra-Leung, Uma Srinivasan
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Patent number: 9000083Abstract: Polymer-inorganic particle blends are incorporated into structures generally involving interfaces with additional materials that can be used advantageously for forming desirable devices. In some embodiments, the structures are optical structures, and the interfaces are optical interfaces. The different materials at the interface can have differences in index-of-refraction to yield desired optical properties at the interface. In some embodiments, structures are formed with periodic variations in index-of-refraction. In particular, photonic crystals can be formed. Suitable methods can be used to form the desired structures.Type: GrantFiled: December 2, 2013Date of Patent: April 7, 2015Assignee: NanoGram CorporationInventor: Nobuyuki Kambe
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Patent number: 8912083Abstract: The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.Type: GrantFiled: May 23, 2011Date of Patent: December 16, 2014Assignee: NanoGram CorporationInventors: Guojun Liu, Uma Srinivasan, Shivkumar Chiruvolu
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Publication number: 20140346436Abstract: Silicon based nanoparticle inks are formulated with viscous polycyclic alcohols to control the rheology of the inks. The inks can be formulated into pastes with non-Newtonian rheology and good screen printing properties. The inks can have low metal contamination such that they are suitable for forming semiconductor structures. The silicon based nanoparticles can be elemental silicon particles with or without dopant.Type: ApplicationFiled: May 20, 2014Publication date: November 27, 2014Applicant: NanoGram CorporationInventors: Weidong Li, Masaya Soeda, Gina Elizabeth Pengra-Leung, Shivkumar Chiruvolu
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Patent number: 8895962Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.Type: GrantFiled: March 23, 2011Date of Patent: November 25, 2014Assignee: NanoGram CorporationInventors: Shivkumar Chiruvolu, Igor Altman, Bernard M. Frey, Weidong Li, Guojun Liu, Robert B. Lynch, Gina Elizabeth Pengra-Leung, Uma Srinivasan
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Patent number: 8853527Abstract: Photovoltaic modules comprise solar cells having doped domains of opposite polarities along the rear side of the cells. The doped domains can be located within openings through a dielectric passivation layer. In some embodiments, the solar cells are formed from thin silicon foils. Doped domains can be formed by printing inks along the rear surface of the semiconducting sheets. The dopant inks can comprise nanoparticles having the desired dopant.Type: GrantFiled: February 15, 2008Date of Patent: October 7, 2014Assignee: NanoGram CorporationInventor: Henry Hieslmair
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Publication number: 20140162445Abstract: The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.Type: ApplicationFiled: February 14, 2014Publication date: June 12, 2014Applicant: NanoGram CorporationInventors: Guojun Liu, Uma Srinivasan, Shivkumar Chiruvolu
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Publication number: 20140151706Abstract: Silicon nanoparticle inks provide a basis for the formation of desirable materials. Specifically, composites have been formed in thin layers comprising silicon nanoparticles embedded in an amorphous silicon matrix, which can be formed at relatively low temperatures. The composite material can be heated to form a nanocrystalline material having crystals that are non-rod shaped. The nanocrystalline material can have desirable electrical conductive properties, and the materials can be formed with a high dopant level. Also, nanocrystalline silicon pellets can be formed from silicon nanoparticles deposited form an ink in which the pellets can be relatively dense although less dense than bulk silicon. The pellets can be formed from the application of pressure and heat to a silicon nanoparticle layer.Type: ApplicationFiled: February 7, 2014Publication date: June 5, 2014Applicant: NanoGram CorporationInventors: Guojun Liu, Shivkumar Chiruvolu, Weidong Li, Uma Srinivasan
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Publication number: 20140138135Abstract: Highly uniform silicon/germanium nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silicon/germanium particles can be surface modified to form the dispersions. The silicon/germanium nanoparticles can be doped to change the particle properties. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to form selectively doped deposits of semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.Type: ApplicationFiled: December 31, 2013Publication date: May 22, 2014Applicant: NanoGram CorporationInventors: Henry Hieslmair, Vladimir K. Dioumaev, Shivkumar Chiruvolu, Hui Du
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BACK CONTACT SOLAR CELLS WITH EFFECTIVE AND EFFICIENT DESIGNS AND CORRESPONDING PATTERNING PROCESSES
Publication number: 20140106551Abstract: Laser based processes are used alone or in combination to effectively process doped domains for semiconductors and/or current harvesting structures. For example, dopants can be driven into a silicon/germanium semiconductor layer from a bare silicon/germanium surface using a laser beam. Deep contacts have been found to be effective for producing efficient solar cells. Dielectric layers can be effectively patterned to provide for selected contact between the current collectors and the doped domains along the semiconductor surface. Rapid processing approaches are suitable for efficient production processes.Type: ApplicationFiled: December 16, 2013Publication date: April 17, 2014Applicant: NanoGram CorporationInventors: Uma Srinivasan, Xin Zhou, Henry Hieslmair, Neeraj Pakala -
Publication number: 20140084222Abstract: Polymer-inorganic particle blends are incorporated into structures generally involving interfaces with additional materials that can be used advantageously for forming desirable devices. In some embodiments, the structures are optical structures, and the interfaces are optical interfaces. The different materials at the interface can have differences in index-of-refraction to yield desired optical properties at the interface. In some embodiments, structures are formed with periodic variations in index-of-refraction. In particular, photonic crystals can be formed. Suitable methods can be used to form the desired structures.Type: ApplicationFiled: December 2, 2013Publication date: March 27, 2014Applicant: NanoGram CorporationInventor: Nobuyuki Kambe
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Patent number: 8658726Abstract: Desirable composites of polysiloxane polymers and inorganic nanoparticles can be formed based on the appropriate selection of the surface properties of the particles and the chemical properties of the polymer. High loadings of particles can be achieved with good dispersion through the polymer. The composites can have good optical properties. In some embodiments, the inorganic particles are substantially free of surface modification.Type: GrantFiled: March 18, 2013Date of Patent: February 25, 2014Assignee: NanoGram CorporationInventors: Hui Du, Shivkumar Chiruvolu, Ang-Ling Chu
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Publication number: 20140047996Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.Type: ApplicationFiled: October 28, 2013Publication date: February 20, 2014Applicant: NanoGram CorporationInventor: Nobuyuki Kambe