Patents Assigned to Nanoink, Inc.
  • Publication number: 20130090253
    Abstract: Methods and apparatus for the accurate quantitation of biomarkers in dried blood spots (DBS), including providing a substrate comprising at least one DBS, wherein the DBS comprises at least one biomolecule distributed on the substrate in a gradient pattern; excising at least one sector-shaped sample from the DBS; and assaying the biomolecule in the sector-shaped sample.
    Type: Application
    Filed: September 21, 2012
    Publication date: April 11, 2013
    Applicant: NANOINK, INC.
    Inventor: NanoInk, Inc.
  • Patent number: 8393011
    Abstract: A device comprising at least one cantilever comprising at least one piezoresistor is described, where the cantilevers comprise silicon nitride or silicon carbide and the piezoresistors comprise doped silicon. Methods for making and using such a device are also provided.
    Type: Grant
    Filed: May 13, 2009
    Date of Patent: March 5, 2013
    Assignee: NanoInk, Inc.
    Inventors: Joseph S. Fragala, Albert K. Henning, Raymond R. Shile
  • Patent number: 8387529
    Abstract: Stamps and methods of making stamps for applications in anti-counterfeiting and authentication. The stamps are relatively small in size and feature nanoscale and microscale identification regions and features. High throughput manufacturing and high resolution methods are used to make the stamps including electron beam lithography and optical lithography. Anti-fouling coatings can be applied.
    Type: Grant
    Filed: November 1, 2011
    Date of Patent: March 5, 2013
    Assignee: NanoInk, Inc.
    Inventors: Joseph S. Fragala, Cedric Loiret-Bernal, Hua Zhang, Raymond Roger Shile, Bjoern Rosner, Sylvain Cruchon-Dupeyrat
  • Patent number: 8382002
    Abstract: Improved methods, devices, compositions, and systems are provided for concealing information on articles in commerce, such as pharmaceuticals, to improve detection of counterfeits. Embodiments are provided where Moiré patterns on article surfaces are detectable using a revealing layer only when the surfaces are illuminated at or near particular angles. Embodiments incorporating revealing layers into detection systems, such as microscopes, are also provided. A method comprising: providing at least one pharmaceutical composition which comprises at least one surface which comprises at least one area which is adapted to provide a Moiré base layer; illuminating the area at an angle; imaging the illuminated area with a Moiré revealing layer to generate a Moiré pattern. Such embodiments provide an additional layer of security over previous methods of detecting counterfeit articles.
    Type: Grant
    Filed: January 25, 2011
    Date of Patent: February 26, 2013
    Assignee: Nanoink, Inc.
    Inventors: Bo He, Bjoern Rosner
  • Patent number: 8261368
    Abstract: Devices for performing nanofabrication are provided which provide small volume reaction space and high reaction versatility. A device may include a reaction chamber adapted for nanoscale modification of a substrate and vacuum conditions; a scanning probe tip assembly enclosed within the reaction chamber; a first port coupled to the reaction chamber for delivering a gas; a second port coupled to the reaction chamber for applying a vacuum; and a substrate assembly insertedly mounted to the reaction chamber. The reaction chamber may include a body having one or more flexible walls and one or more supports to prevent the reaction chamber from collapsing under a vacuum. The device may further include an electrical conduit for coupling the tips of the scanning probe tip assembly to electrical components outside the reaction chamber. Also provided are apparatuses incorporating the devices and methods of using the devices and apparatuses.
    Type: Grant
    Filed: May 13, 2009
    Date of Patent: September 4, 2012
    Assignee: NanoInk, Inc.
    Inventors: John Edward Bussan, Michael R. Nelson, Joseph S. Fragala, Albert K. Henning, Jeffrey R. Rendlen
  • Patent number: 8256018
    Abstract: Faster and better methods for leveling arrays including software and user interface for instruments. A method comprising: (i) providing at least one array of cantilevers supported by at least one support structure, (ii) providing at least one substrate, (iii) providing at least one instrument to control the position of the array with respect to the substrate, (iv) leveling the array with respect to the substrate, wherein the leveling is performed via a user interface on the instrument which is adapted to have the user input positional information from the motors and piezoelectric extender when at least one cantilever deflects from the substrate. Uniform z-displacements can be achieved.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: August 28, 2012
    Assignee: NanoInk, Inc.
    Inventors: Jason Haaheim, Vadim Val-Khvalabov
  • Patent number: 8256017
    Abstract: A calibration leveling system and method are provided which improve printing and imaging at the nanoscale including improved tip-based deposition and nanolithography. The system can include a scanning probe instrument having a video camera with an adjustable lens. The scanner can be coupled to a one or two dimensional array of cantilevers comprising cantilever tips for imaging or printing. The scanning probe instrument has one or more motors for controlling the scanner in the z-axis. The z-axis motors position the scanner so that the cantilever tips are in a level orientation relative to the surface of a substrate. Once the cantilever tips are level with the substrate, the positions of the z-axis motors can be recorded for future reference.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: August 28, 2012
    Assignee: NanoInk, Inc.
    Inventor: Jason Haaheim
  • Patent number: 8220317
    Abstract: Massive parallel printing of structures and nanostructures at high speed with high resolution and high quality using two dimensional arrays comprising cantilevers and tip-based transfer of material to a surface. The array is designed so only tips touch the surface. This can be accomplished by long tips and bent cantilevers and alignment. An article comprising: a two-dimensional array of a plurality of cantilevers, wherein the array comprises a plurality of base rows, each base row comprising a plurality of cantilevers, wherein each of the cantilevers comprise tips at the cantilever end away from the base, wherein the number of cantilevers is greater than 250, and wherein the tips have an apex height relative to the cantilever of at least four microns, and a support for the array. Combinatorial arrays and bioarrays can be prepared. The arrays can be manufactured by micromachining methods.
    Type: Grant
    Filed: March 23, 2007
    Date of Patent: July 17, 2012
    Assignees: Northwestern University, NanoInk, Inc.
    Inventors: Chad A. Mirkin, Khalid Salaita, Yuhuang Wang, Joseph S. Fragala, Raymond R. Shile
  • Patent number: 8214916
    Abstract: Better leveling procedures for patterning at the small scale including the nanoscale. A method comprising: providing at least one array of cantilevers comprising tips thereon, wherein the cantilevers comprise at least one relatively bright spot, or at least two relatively bright spots, near the tip upon viewing, providing a substrate, leveling the array and the substrate with respect to each other, wherein the relatively bright spot near the tip is viewed to determine a contact of the tip and substrate.
    Type: Grant
    Filed: January 25, 2010
    Date of Patent: July 3, 2012
    Assignee: NanoInk, Inc.
    Inventors: Nabil A. Amro, Raymond Sanedrin
  • Patent number: 8205268
    Abstract: Improved actuation device useful in direct-write nanolithography and imaging including use of a pivot point for downward deflection of a cantilever with long travel path. A device comprising at least one holder, at least one cantilever, an extension of the said cantilever wherein the extension is integrated with an actuator, wherein the cantilever is adapted for actuated movement. The actuator can be electrostatic, thermal, or piezoelectric. The cantilever can comprise a tip, and material can be transferred from the tip to a surface.
    Type: Grant
    Filed: November 25, 2008
    Date of Patent: June 19, 2012
    Assignee: NanoInk, Inc.
    Inventor: Raymond Roger Shile
  • Patent number: 8071168
    Abstract: A new, low temperature method for directly writing conductive metal traces with micron and sub-micron sized features. In this method, a flat beam is used, such as an AFM cantilever, with or without a tip, to draw traces of metal precursor ink onto a substrate. The dimensions of the metal traces can be directly controlled by the geometry of the cantilever, so that one can controllably deposit traces from 1 micron to over 100 microns wide with microfabricated cantilevers. Cantilevers with sharp tips can be used to further shrink the minimum features sizes to sub-micron scale. The height of the features can be increased by building layers of similar or different material.
    Type: Grant
    Filed: February 25, 2005
    Date of Patent: December 6, 2011
    Assignee: Nanoink, Inc.
    Inventors: Sylvain Cruchon-Dupeyrat, Hua Zhang, Robert Elghanian, Linette Demers, Nabil Amro, Sandeep Disawal, John Bussan
  • Patent number: 8069782
    Abstract: Stamps and methods of making stamps for applications in anti-counterfeiting and authentication. The stamps are relatively small in size and feature nanoscale and microscale identification regions and features. High throughput manufacturing and high resolution methods are used to make the stamps including electron beam lithography and optical lithography. Anti-fouling coatings can be applied.
    Type: Grant
    Filed: December 19, 2005
    Date of Patent: December 6, 2011
    Assignee: Nanoink, Inc.
    Inventors: Joseph S. Fragala, Cedric Loiret-Bernal, Hua Zhang, Raymond Roger Shile, Bjoern Rosner, Sylvain Cruchon-Dupeyrat
  • Patent number: 8043652
    Abstract: A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.
    Type: Grant
    Filed: September 10, 2007
    Date of Patent: October 25, 2011
    Assignee: Nanoink, Inc.
    Inventors: Raymond K. Eby, Michael Nelson, Igor Touzov
  • Patent number: 8017191
    Abstract: A method of dipping a nanoscopic probe comprising dipping a nanoscopic tip at a dipping rate into an inkwell comprising ink, wherein the dipping rate is configured to be sufficiently faster than a rate of wicking. A nanoscopic probe comprising a nanoscopic tip and an inkwell configured to contain ink, wherein the nanoscopic probe is configured to dip into and retract from the ink at a rate that is sufficiently faster than wicking. Wicking can cause excessive amounts of ink to be deposited on nanoscopic tips, which can lead to contamination of inkwells and other nanoscopic tips.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: September 13, 2011
    Assignee: Nanoink, Inc.
    Inventors: Jason Haaheim, Gregory Athas
  • Patent number: 7762638
    Abstract: Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation.
    Type: Grant
    Filed: April 7, 2006
    Date of Patent: July 27, 2010
    Assignee: NanoInk, Inc.
    Inventors: Sylvain Cruchon-Dupeyrat, Michael Nelson, Robert Elghanian, Joseph S. Fragala, Igor Touzov, Debjyoti Banerjee
  • Patent number: 7691541
    Abstract: Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips (e.g., atomic force microscope tips, etc.) for deposition of ink materials including sol-gel inks. Additive methods can be combined with subtractive methods. Holes can be filled with nanostructures. Heights of the nanostructures filling the holes can be controlled without losing control of the lateral dimensions of the nanostructures. Phase shifters on phase shifting masks (PSMs) are additively repaired with selectively deposited sol-gel material that is converted to solid oxide, which has optical transparency and index of refraction adapted for the phase shifters repaired.
    Type: Grant
    Filed: October 21, 2003
    Date of Patent: April 6, 2010
    Assignee: NanoInk, Inc.
    Inventors: Percy Van Crocker, Sylvain Cruchon-Dupeyrat, Linette Demers, Robert Elghanian, Sandeep Disawal, Nabil Amro, Hua Zhang
  • Patent number: 7491422
    Abstract: A novel method of transporting ink to a substrate with dip-pen nanolithographic (DPN) stamp tips coated with polymer (e.g., polydimethylsiloxane (PDMS), etc.). This kind of tip adsorbs chemicals (“inks”) easily and is used to generate DPN nanopatterns that are imaged with the same tip after a DPN process. This method builds a bridge between micro-contact printing (?CP) and DPN, making it possible for one to easily generate smaller structures of any molecules that have been patterned by the ?CP technique. The easy tip-coating and writing process enriches the state-of-the-art DPN technique. The sub-100 nm DPN resolution obtained by using this kind of novel tip is comparable to that with a conventional Si3N4 probe tip. Importantly, the unique stamp tip was able to transfer solvent (e.g., liquid “ink”) onto a substrate, resulting in fabrication of hollow nanostructures with only one DPN holding/writing step.
    Type: Grant
    Filed: February 14, 2005
    Date of Patent: February 17, 2009
    Assignee: Nanoink, Inc.
    Inventors: Hua Zhang, Robert Elghanian, Linette Demers, Nabil Amro, Sandeep Disawal, Sylvain Cruchon-Dupeyrat
  • Patent number: 7279046
    Abstract: A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: October 9, 2007
    Assignee: NanoInk, Inc.
    Inventors: Raymond K. Eby, Michael Nelson, Igor Touzov
  • Patent number: 7199305
    Abstract: The invention provides a nanolithographic protosubstrate adapted for nanolithographic formation of nanostructures on the protosubstrate comprising: a substrate having a top surface exposed for nanolithographic formation of nanostructures, wherein the top surface comprises: electrically insulating surface regions; and at least one discreet electrode topology surrounded by the electrically insulating surface regions, wherein the electrode topology is adapted with electrical interconnections for electrically coupling the electrode topology to an external device.
    Type: Grant
    Filed: May 23, 2003
    Date of Patent: April 3, 2007
    Assignee: NanoInk, Inc.
    Inventors: Sylvain Cruchon-Dupeyrat, Michael Nelson, Jeff Rendlen, Joseph Fragala
  • Patent number: 7098056
    Abstract: A method for producing carbon nanotubes, the method comprising: (a) providing a substrate with a top surface, (b) forming an island of catalyst material on the top surface using a tip having a patterning compound thereon, (c) heating the substrate and catalyst island, and (d) contacting the catalyst island with a carbon-containing gas for a period of time sufficient to form the nanotubes on the catalyst island.
    Type: Grant
    Filed: August 11, 2003
    Date of Patent: August 29, 2006
    Assignee: Nanoink, Inc.
    Inventor: Linette Demers