Abstract: A substrate surface comprises at least partially at least one elongated structure, wherein each elongated structure comprises a plurality of channels, said channels extending in the direction of the longitudinal axis of the elongated structure, wherein said at least one elongated structure comprises silicon dioxide. The structures are manufactured by: a) providing a reaction solution comprising a silicate, a micelle forming agent, an alkane, a salt, and at least 1.5 M HCl, having a pH of 2 or lower, b) stirring not more than 10 minutes, c) bringing the reaction solution into contact with a substrate surface and d) treating the obtained material with one method selected from a) heat treating the material above 300° C., b) treating the material with at least one selected from H2O2, and H2SO4, c) treating the material with microwaves to digest the micelle forming agent.

Abstract: A method for the manufacture of crystallite particles, said method comprising the steps of: a) reacting a reaction solution comprising a silicate, a micelle forming agent, an alkane, a salt under stirring at pH 2 or lower, wherein the reaction solution comprises HCI in a concentration of at least 1.5 M, wherein the stirring is performed not more than 10 minutes, and b) treating the obtained material to remove the micelle forming agent with one method selected from i) heat treating the material above 300° C., ii) treating the material with at least one selected from H2O2, and H2SO4, iii) treating the material with microwaves to digest the micelle forming agent. An advantage is that the time for the synthesis is shortened considerably compared to the prior art.

Abstract: A method for the manufacture of crystallite particles, said method comprising the steps of: a) reacting a reaction solution comprising a silicate, a micelle forming agent, an alkane, a salt under stirring at pH 2 or lower, wherein the reaction solution comprises HCI in a concentration of at least 1.5 M, wherein the stirring is performed not more than 10 minutes, and b) treating the obtained material to remove the micelle forming agent with one method selected from i) heat treating the material above 300° C., ii) treating the material with at least one selected from H2O2, and H2SO4, iii) treating the material with microwaves to digest the micelle forming agent. An advantage is that the time for the synthesis is shortened considerably compared to the prior art.

Abstract: A substrate surface comprises at least partially at least one elongated structure, wherein each elongated structure comprises a plurality of channels, said channels extending in the direction of the longitudinal axis of the elongated structure, wherein said at least one elongated structure comprises silicon dioxide. The structures are manufactured by: a) providing a reaction solution comprising a silicate, a micelle forming agent, an alkane, a salt, and at least 1.5 M HCl, having a pH of 2 or lower, b) stirring not more than 10 minutes, c) bringing the reaction solution into contact with a substrate surface and d) treating the obtained material with one method selected from a) heat treating the material above 300° C., b) treating the material with at least one selected from H2O2, and H2SO4, c) treating the material with microwaves to digest the micelle forming agent.