Patents Assigned to Nanolnk, Inc.
  • Patent number: 8261662
    Abstract: Improved actuated probes suitable for scanning probe lithography or microscopy, and especially direct-write nanolithography and method of fabrication thereof. In one embodiment, thermomechanically actuated cantilevers with oxide-sharpened microcast tips are inexpensively fabricated by a process that comprises low-temperature wafer bonding, such as (gold) thermocompressive bonding, eutectic or adhesive bonding. Also provided is a flexcircuit that electrically interconnects the actuated probes to external circuitry and mechanically couples them to the instrument actuator. An improved scanning probe lithography instrument, hardware and software, can be built around the actuated cantilevers and the flexcircuit. Finally, provided is an improved microfluidic circuit to deliver chemical compounds to the tips of (actuated) probes and a fabrication method for tall, high-aspect-ratio tips.
    Type: Grant
    Filed: November 8, 2005
    Date of Patent: September 11, 2012
    Assignee: Nanolnk, Inc.
    Inventors: Raymond Roger Shile, Terrisa Duenas, John Edward Bussan, Gregory J. Athas, Joseph S. Fragala, Jason R. Haaheim, Sylvain Cruchon-Dupeyrat, Jeffrey R. Rendlen
  • Patent number: 8235302
    Abstract: Methods for providing pharmaceutical compositions and objects with identification regions and identification features which are difficult to detect. Microlithography, nanolithography, and stamping methods are used. The identification features can be positive protrusions or negative indentations with respect to the surface. The identification regions can comprise bar codes and holograms. DPN printing or other lithographies such as electron beam lithography, optical lithography, or nanoimprint lithography can be used to prepare stamps, which are then used to prepare the identification features. Redundant patterns can be formed. The invention is useful for counterfeit prevention. An apparatus for stamping the identification features is also described.
    Type: Grant
    Filed: April 20, 2005
    Date of Patent: August 7, 2012
    Assignee: Nanolnk, Inc.
    Inventors: Cedric Loiret-Bernal, Linette Demers, Bjoern Rosner, Michael Nelson, Ray Eby, Joseph S. Fragala, Raymond Roger Shile, Hua Zhang, John Edward Bussan, Sylvain Cruchon-Dupeyrat
  • Publication number: 20100071098
    Abstract: A dual tip probe for scanning probe epitaxy is disclosed. The dual tip probe includes first and second tips disposed on a cantilever arm. The first and second tips can be a reader tip and a synthesis tip, respectively. The dual tip probe further includes a rib disposed on the cantilever arm between the first and second tips. The dual tip probe can also include a strain gauge disposed along the length of the cantilever arm.
    Type: Application
    Filed: May 13, 2009
    Publication date: March 18, 2010
    Applicants: NORTHWESTERN UNIVERSITY, Nanolnk, Inc.
    Inventors: Chad A. Mirkin, Chang Liu, Yuhuang Wang, Adam B. Braunschweig, Xing Liao, Louise R. Giam, Byung Y. Lee, Shifeng Li, Joseph S. Fragala, Albert K. Henning
  • Publication number: 20040101469
    Abstract: A method for producing carbon nanotubes, the method comprising: (a) providing a substrate with a top surface, (b) forming an island of catalyst material on the top surface using a tip having a patterning compound thereon, (c) heating the substrate and catalyst island, and (d) contacting the catalyst island with a carbon-containing gas for a period of time sufficient to form the nanotubes on the catalyst island.
    Type: Application
    Filed: August 11, 2003
    Publication date: May 27, 2004
    Applicant: Nanolnk, Inc.
    Inventor: Linette Demers
  • Publication number: 20040026681
    Abstract: The invention provides a nanolithographic protosubstrate adapted for nanolithographic formation of nanostructures on the protosubstrate comprising: a substrate having a top surface exposed for nanolithographic formation of nanostructures, wherein the top surface comprises: electrically insulating surface regions; and at least one discreet electrode topology surrounded by the electrically insulating surface regions, wherein the electrode topology is adapted with electrical interconnections for electrically coupling the electrode topology to an external device.
    Type: Application
    Filed: May 23, 2003
    Publication date: February 12, 2004
    Applicant: Nanolnk, Inc.
    Inventors: Sylvain Cruchon-Dupeyrat, Michael Nelson, Jeff Rendlen, Joseph Fragala