Patents Assigned to Nanoplazz Technologies Ltd.
  • Patent number: 12708890
    Abstract: The present disclosure is related to the field of chemistry and provides methods and devices for stimulation of endothermic reactions in gas phase with high activation barriers by nanosecond pulsed electrical discharge. It can be used for, e.g., CO2 functionalization of methane, H2S dissociation, hydrogen and syngas production, for processing ammonia synthesis and dissociation, etc. Some embodiments include methods and devices associated with the stimulation of plasma chemical reactions with nanosecond pulse electric discharge in the presence of gas flow.
    Type: Grant
    Filed: August 4, 2021
    Date of Patent: August 18, 2026
    Assignee: NANOPLAZZ TECHNOLOGIES LTD.
    Inventors: Dmitry Medvedev, Mikhail Marin, Evgeny Gorelik, Boris Mislavsky, Roman Iliev
  • Publication number: 20220234899
    Abstract: A system for manufacturing a nanomaterial may include a first electrode; a second electrode spaced apart from the first electrode by a gap; and a chamber configured to enclose the first electrode, the second electrode, and a liquid. The system may also include a power supply configured to provide electrical energy to at least one of the first electrode and the second electrode; and a pump configured to cause the liquid to flow through the gap between the first electrode and the second electrode.
    Type: Application
    Filed: June 5, 2020
    Publication date: July 28, 2022
    Applicant: Nanoplazz Technologies Ltd.
    Inventors: Dmitry MEDVEDEV, Mikhail MARIN, Evgeny GORELIK, Boris MISLAVSKY, Roman ILIEV