Patents Assigned to Nanoscribe GmbH
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Patent number: 10870243Abstract: The invention relates to a method and a device for producing at least one microstructure (5) on an axial end (1a) of an optical fiber (1). The method comprises the following steps: —providing (S10) the optical fiber (1); —wetting (S20) the axial end (1a) of the optical fiber (1) with photoresist (2); —orienting (S30) the optical fiber (1) and a writing beam of a 3D printer with respect to one another; —forming (S40) the at least one microstructure (5) by exposing the photoresist (2) to light with the aid of the 3D printer.Type: GrantFiled: October 7, 2016Date of Patent: December 22, 2020Assignees: BADEN-WÜRTTEMBERG STIFTUNG gGmbH, Nanoscribe GmbHInventors: Harald Gießen, Michael Thiel, Timo Gissibl
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Publication number: 20200147865Abstract: A dispenser attachment for microscope objective lenses, in a device for writing three-dimensional structures by means of laser lithography in a lithographic fluid, which can be solidified by irradiation with laser light. The dispenser attachment may be adapted for being placed onto an objective lens.Type: ApplicationFiled: October 29, 2019Publication date: May 14, 2020Applicant: Nanoscribe GmbHInventors: Joerg Hoffmann, Thomas Sauter, Christoph Linden, Christian Schach
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Publication number: 20200047408Abstract: A system, computer program product and method for producing a three-dimensional overall structure by means of laser lithography, the overall structure being approximated by at least one partial structure, wherein, for the purposes of writing the partial structure, an exposure dose is radiated into the lithography material in a focal region of a laser writing beam while exploiting multi-photon absorption. Here, in the partial structure, the exposure dose in those edge portions that immediately adjoin an external surface of the overall structure to be produced is modified in comparison with the remaining partial structure.Type: ApplicationFiled: February 7, 2018Publication date: February 13, 2020Applicant: Nanoscribe GmbHInventors: Yann TANGUY, Nicole Lindenmann
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Patent number: 10118376Abstract: A method for producing a three-dimensional overall structure (18) by a structuring device (10a, 10b), which has a predefined principal direction (16) of the structure entry in a writing region (20). The overall structure (18) is defined by sequential definition of a plurality of partial structures (22) that complement one another overall to form the overall structure (18). The partial structures (22) are delimited in each case within enveloping interfaces (36). In this case, the partial structures (22) are chosen in such a way that the enveloping interfaces (36) extend obliquely with respect to the principal direction (16) of the structure entry.Type: GrantFiled: April 28, 2016Date of Patent: November 6, 2018Assignee: NANOSCRIBE GMBHInventors: Roman Reinhard Reiner, Yann Tanguy, Joerg Hoffmann
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Publication number: 20180281324Abstract: The invention relates to a method and a device for producing at least one microstructure (5) on an axial end (1a) of an optical fiber (1). The method comprises the following steps: —providing (S10) the optical fiber (1); —wetting (S20) the axial end (1a) of the optical fiber (1) with photoresist (2); —orienting (S30) the optical fiber (1) and a writing beam of a 3D printer with respect to one another; —forming (S40) the at least one microstructure (5) by exposing the photoresist (2) to light with the aid of the 3D printer.Type: ApplicationFiled: October 7, 2016Publication date: October 4, 2018Applicants: BADEN-WÜRTTEMBERG STIFTUNG gGmbH, Nanoscribe GmbHInventors: Harald Gießen, Michael Thiel, Timo Gissibl
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Patent number: 9937664Abstract: A method for producing a three-dimensional structure (10) in a lithographic material (24) that can be polymerized and thus solidified using energy input methods, wherein initially a shell wall (16) of the three-dimensional structure (10) to be produced is polymerized so as to form a polymerized shell wall (16) such that a volume (28) of unpolymerized lithographic material is enclosed using a first, spatially resolving energy input method, wherein the lithographic material (24) surrounding the polymerized shell wall (16) is removed in an intermediate development step, wherein subsequently the volume (28) enclosed by the shell wall (16) is polymerized using a second energy input method.Type: GrantFiled: September 29, 2015Date of Patent: April 10, 2018Assignee: Nanoscribe GmbHInventors: Michael Thiel, Roman Reinhard Reiner, Fabian Niesler, Yann Tanguy
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Patent number: 9798248Abstract: The invention relates to a method for producing a structure in a lithographic material, wherein the structure in the lithographic material is defined by means of a writing beam of an exposure device, in that a plurality of partial structures are written sequentially, wherein for writing the partial structures a write field of the exposure device is displaced and positioned sequentially and that a partial structure is written in the write field in each case, and wherein for positioning of the write field a reference structure is detected by means of an imaging measuring device.Type: GrantFiled: July 16, 2015Date of Patent: October 24, 2017Assignee: Nanoscribe GmbHInventors: Joerg Hoffmann, Philipp Simon, Michael Thiel, Martin Hermatschweiler, Holger Fischer
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Publication number: 20160332365Abstract: A method for producing a three-dimensional overall structure (18) by a structuring device (10a, 10b), which has a predefined principal direction (16) of the structure entry in a writing region (20). The overall structure (18) is defined by sequential definition of a plurality of partial structures (22) that complement one another overall to form the overall structure (18). The partial structures (22) are delimited in each case within enveloping interfaces (36). In this case, the partial structures (22) are chosen in such a way that the enveloping interfaces (36) extend obliquely with respect to the principal direction (16) of the structure entry.Type: ApplicationFiled: April 28, 2016Publication date: November 17, 2016Applicant: Nanoscribe GmbHInventors: Roman Reinhard Reiner, Yann Tanguy, Joerg Hoffmann
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Patent number: 9302430Abstract: A method for the spatially resolved introduction of an intensity pattern of electro-magnetic radiation by at least one optic display system into a photosensitive substance having properties which can be changed by photon exposure. These properties include a first, liquid and at least one second state, with the electro-magnetic radiation being conducted via the optic display system into the photosensitive substance and here being projected on predetermined spatial coordinates, in order to create at or in an area of these spatial coordinates a change of the properties of the substance. A surface of an objective lens of the optic display system, through which the electro-magnetic radiation 4 is emitted, is immersed in the liquid photosensitive substance 2. A corresponding device is provided, and the device and method can be used for the creation of micro or nano-scaled structures.Type: GrantFiled: February 27, 2012Date of Patent: April 5, 2016Assignee: Nanoscribe GmbHInventors: Michael Thiel, Holger Fischer
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Patent number: 8986563Abstract: A method for producing three-dimensional microstructures in which a source material is applied on a substrate, with a property changing by exposure with electromagnetic radiation. A three-dimensional source structure is written via spatially-resolving exposure in the source material, the source material is removed except for the source structure, and the source structure is molded with a target material, from which the microstructure to be produced is made. Here, a shell structure is provided surrounding the microstructure to be produced, with the source structure being created as the shell structure or the shell structure is produced using the source structure, and subsequently the target material is inserted into the shell structure.Type: GrantFiled: June 22, 2012Date of Patent: March 24, 2015Assignee: Nanoscribe GmbHInventors: Michael Thiel, Martin Hermatschweiler
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Patent number: 8389893Abstract: A method for laser beam machining of a workpiece in which a laser beam is focused by an objective, into or onto the workpiece having a boundary surface, to produce a machining effect by a two-photon process, and the position of the focal point with respect to the workpiece is shifted. To obtain a reference for the position of the focal point, an image of a luminating modulation object is projected through the objective onto the workpiece into the focal plane or so as to intersect it. Reflections of the image occurring at the boundary surface are imaged into an autofocus image plane, and are detected by a camera. The camera image plane either intersects the autofocus image plane when the image of the illuminating modulation object lies in the focal plane, or lies in the autofocus image plane when the image of the modulation object intersects the focal plane.Type: GrantFiled: November 20, 2008Date of Patent: March 5, 2013Assignee: Nanoscribe GmbHInventors: Michael Kempe, Peter Westphal, Wolfgang Grau, Georg von Freymann
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Publication number: 20120325775Abstract: A method for producing three-dimensional microstructures in which a source material is applied on a substrate, with a property changing by exposure with electromagnetic radiation. A three-dimensional source structure is written via spatially-resolving exposure in the source material, the source material is removed except for the source structure, and the source structure is molded with a target material, from which the microstructure to be produced is made. Here, a shell structure is provided surrounding the microstructure to be produced, with the source structure being created as the shell structure or the shell structure is produced using the source structure, and subsequently the target material is inserted into the shell structure.Type: ApplicationFiled: June 22, 2012Publication date: December 27, 2012Applicant: NANOSCRIBE GMBHInventors: Michael Thiel, Martin Hermatschweiler
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Publication number: 20120218535Abstract: A method for the spatially resolved introduction of an intensity pattern of electro-magnetic radiation by at least one optic display system into a photosensitive substance having properties which can be changed by photon exposure. These properties include a first, liquid and at least one second state, with the electro-magnetic radiation being conducted via the optic display system into the photosensitive substance and here being projected on predetermined spatial coordinates, in order to create at or in an area of these spatial coordinates a change of the properties of the substance. A surface of an objective lens of the optic display system, through which the electro-magnetic radiation 4 is emitted, is immersed in the liquid photosensitive substance 2. A corresponding device is provided, and the device and method can be used for the creation of micro or nano-scaled structures.Type: ApplicationFiled: February 27, 2012Publication date: August 30, 2012Applicant: Nanoscribe GmbHInventors: Michael Thiel, Holger Fischer