Abstract: Method (and apparatus) for producing a 3D target structure in lithographic material. Focus region of a laser writing beam travels through a scanning manifold through the lithographic material. In the focus region of the laser writing beam, an exposure dose is irradiated into the lithographic material, and a structure region is locally defined. At least one exposure data set which represents a local exposure dose for the scan manifold as a function of location is determined. A structure which approximates the target structure is defined based on at least one exposure data set. This structure is analyzed and at least one analysis data set which represents the analyzed structure is determined. Deviation data set which represents deviations of the already defined structure from the target structure is determined. At least one correction exposure data set is determined. Correction structure based on the at least one correction exposure data set is defined.

Abstract: A system, computer program product and method for producing a three-dimensional overall structure by means of laser lithography, the overall structure being approximated by at least one partial structure, wherein, for the purposes of writing the partial structure, an exposure dose is radiated into the lithography material in a focal region of a laser writing beam while exploiting multi-photon absorption. Here, in the partial structure, the exposure dose in those edge portions that immediately adjoin an external surface of the overall structure to be produced is modified in comparison with the remaining partial structure.