Patents Assigned to Nanosolor, Inc.
  • Patent number: 6967115
    Abstract: A method for fabricating optoelectronic devices is disclosed. A sacrificial layer is deposited, formed or attached to a target substrate having a plurality of through holes. One or more device layers are formed on the sacrificial layer and the sacrificial layer is exposed to an etchant through the holes in the target substrate to detach the target substrate from the sacrificial layer without destroying the target substrate.
    Type: Grant
    Filed: April 20, 2004
    Date of Patent: November 22, 2005
    Assignee: Nanosolor, Inc.
    Inventor: James R. Sheats