Patents Assigned to NANOSURFACE TECHNOLOGIES, LLC
  • Publication number: 20110054633
    Abstract: A modified atomic plasma deposition (APD) procedure is used to produce amorphous, nonconformal thin metal film coatings on a variety of substrates. The films are porous, mesh-like lattices with imperfections such as pinholes and pores, which are useful as scaffolds for cell attachment, controlled release of bioactive agents and protective coatings.
    Type: Application
    Filed: December 18, 2008
    Publication date: March 3, 2011
    Applicant: NANOSURFACE TECHNOLOGIES, LLC
    Inventors: Tiffany E. Miller, Daniel M. Storey, Barbara S. Kitchell