Abstract: A modified atomic plasma deposition (APD) procedure is used to produce amorphous, nonconformal thin metal film coatings on a variety of substrates. The films are porous, mesh-like lattices with imperfections such as pinholes and pores, which are useful as scaffolds for cell attachment, controlled release of bioactive agents and protective coatings.
Type:
Application
Filed:
December 18, 2008
Publication date:
March 3, 2011
Applicant:
NANOSURFACE TECHNOLOGIES, LLC
Inventors:
Tiffany E. Miller, Daniel M. Storey, Barbara S. Kitchell