Abstract: A projection exposure apparatus comprising: a display device having a reflection-type or transmission-type display portion on which a predetermined image to be exposed is displayed; a stage for holding a substrate to be exposed; and a telecentric-type projection lens for projecting the predetermined image displayed on the display portion onto the surface of the substrate held on the stage.
Type:
Grant
Filed:
November 10, 2000
Date of Patent:
November 22, 2005
Assignees:
National Institute of Advanced Industrial Science and Technology, NanoSystem Solutions, Inc.