Patents Assigned to NanoSystem Solutions, Inc.
  • Patent number: 6967708
    Abstract: A projection exposure apparatus comprising: a display device having a reflection-type or transmission-type display portion on which a predetermined image to be exposed is displayed; a stage for holding a substrate to be exposed; and a telecentric-type projection lens for projecting the predetermined image displayed on the display portion onto the surface of the substrate held on the stage.
    Type: Grant
    Filed: November 10, 2000
    Date of Patent: November 22, 2005
    Assignees: National Institute of Advanced Industrial Science and Technology, NanoSystem Solutions, Inc.
    Inventors: Hiroshi Yokoyama, Kazumi Haga