Patents Assigned to NanoVia, LP
  • Patent number: 6653593
    Abstract: A laser beam delivery system for ablating a desired array of features in an object to be processed. The imaging system comprises a laser, a shaping apparatus for shaping the laser beam into a plurality of separate laser beams, first and second repeat positioners for redirecting the beams, a converging mechanism for converging the laser beams through a clear aperture of a reflective mirror of the first repeat positioner, and a focusing member for focusing the laser beams at a desired one of a plurality of holographic imaging segments. Each one of the holographic imaging segments, comprising the holographic imaging lens, forms a desired formation in a surface of the object to be processed. A number of the components are housed within a rotatable module and a rotational drive is connected to the rotatable module to facilitate rotation thereof relative to the optical axis.
    Type: Grant
    Filed: June 26, 2002
    Date of Patent: November 25, 2003
    Assignee: NanoVia, LP
    Inventors: Todd E. Lizotte, Orest Ohar
  • Patent number: 6420675
    Abstract: An control system for controlling movement of a product to be imaged relative to a laser and operation of a laser. The control system comprises a mechanism for obtaining drill position data from a data storage device. The control system further includes a mechanism for simultaneously sending necessary signals to alter a path of a laser beam emitted by the laser relative to the object to be imaged. The control system further includes a mechanism for providing a feedback to indicate that the path laser beam, from the laser to the product to be imaged, is suitably altered. The control system further includes a mechanism for firing the laser beam for one of burning, drilling or forming a desired formation in a surface of the object to be imaged. The control system further includes a mechanism for returning the control system, when necessary, for reading further drill position data from the data storage device.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: July 16, 2002
    Assignee: Nanovia, LP
    Inventors: Todd E. Lizotte, Orest Ohar, Sunny Collar Waters
  • Patent number: 6310701
    Abstract: An apparatus and process for ablating an array matrix of high-density vias in a flexible and rigid desired object. The apparatus contains a mirror based x, y scanning repeat positioning and/or a single axis scanner positioning system that directs a single point of a coherent light radiation beam at desired individual mask segments. These mask segments are formed into a planar mask array. A flat field collimating lens system is positioned between the mirror scanning system and the mask arrays to correct the angular beam output of the repeat positioning mirror and redirects the beam so that it strikes a specific rear surface segment(s) of in the mask array. The flat field collimating lens provides a beam that either illuminates the mask perpendicular to its surface or at preselected optimized illumination angles.
    Type: Grant
    Filed: February 28, 2000
    Date of Patent: October 30, 2001
    Assignee: Nanovia LP
    Inventor: Todd E. Lizotte
  • Patent number: 6256121
    Abstract: An imaging system for ablating an array matrix of high-density vias in a flexible and rigid desired object. The apparatus contains a mirror based x, y scanning repeat positioning and/or a single axis scanner positioning system that directs a single point of a coherent light radiation beam at desired individual mask segments. These mask segments are formed into a planar mask array. A flat field collimating lens system is positioned between the mirror scanning system and the mask arrays to correct the angular beam output of the repeat positioning mirror and redirects the beam so that it strikes a specific rear surface segment(s) of in the mask array. The flat field collimating lens provides a beam that either illuminates the mask perpendicular to its surface or at preselected optimized illumination angles. Once illuminated, the specific segment of the mask array images and processes a single or a plurality of desired holes or features in a top surface of a flexible or rigid desired object to be processed.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: July 3, 2001
    Assignee: NanoVia, LP
    Inventors: Todd E. Lizotte, Orest Ohar