Patents Assigned to Nanya Technology Corportion
  • Mask structure
    Patent number: 9069253
    Abstract: A mask structure, including a substrate; an absorber layer formed on the substrate; and a patterned reflection layer formed on the absorber layer. Optionally, the mask structure may further include a buffer layer, a conductive coating, or combinations thereof. The buffer layer may be formed between the absorber layer and the reflection layer, and the conductive coating may be formed at a back side of the substrate.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: June 30, 2015
    Assignee: Nanya Technology Corportion
    Inventors: Yu-Mei Ni, Chun-Yen Huang, Pei-Cheng Fan