Abstract: In a quartz glass, a mark is internally made such that a retardation generated in close proximity to the end of the mark is up to 20 nm. The internally marked quartz glass in which internal marks are created without sacrificing optical precision finds use as quartz glass substrates for optical members in the electronic industry.
Type:
Grant
Filed:
September 13, 2002
Date of Patent:
June 1, 2004
Assignees:
Shin-Etsu Chemical Co., Ltd., Naoetsu Precision Co., Ltd.