Abstract: A Ga2O3 semiconductor element includes: an n-type ?-Ga2O3 single crystal film, which is formed on a high-resistance ?-Ga2O3 substrate directly or with other layer therebetween; a source electrode and a drain electrode, which are formed on the n-type ?-Ga2O3 single crystal film; and a gate electrode, which is formed on the n-type ?-Ga2O3 single crystal film between the source electrode and the drain electrode.
Type:
Grant
Filed:
September 7, 2012
Date of Patent:
September 6, 2016
Assignees:
TAMURA CORPORATION, NATIONAI INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY
Abstract: A Ga2O3 semiconductor element includes: an n-type ?-Ga2O3 single crystal film, which is formed on a high-resistance ?-Ga2O3 substrate directly or with other layer therebetween; a source electrode and a drain electrode, which are formed on the n-type ?-Ga2O3 single crystal film; and a gate electrode, which is formed on the n-type ?-Ga2O3 single crystal film between the source electrode and the drain electrode.
Type:
Grant
Filed:
September 7, 2012
Date of Patent:
July 19, 2016
Assignees:
TAMURA CORPORATION, NATIONAI INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY