Patents Assigned to NATIONAL CHUNG SAN INSTITUTE OF SCIENCE AND TECHNOLOGY
  • DCPD-derived polyether and method of producing the same
    Patent number: 10711103
    Abstract: A low-k, non-flammable dicyclopentdiene (DCPD)-derived polyether and a method of producing the same are introduced. Incorporation of a phosphorus group and a DCPD derivative into a low-k, non-flammable dicyclopentdiene (DCPD)-derived polyether enable the DCPD-derived polyether to not only serve as an epoxy resin curing agent but also cure itself such that the cured product not only features satisfactory thermal properties and low-k characteristics but is also non-flammable.
    Type: Grant
    Filed: November 30, 2017
    Date of Patent: July 14, 2020
    Assignee: NATIONAL CHUNG SAN INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Wen-Chiung Su, Ching-Hsuan Lin, Wei-Feng Hsiao, Han-Ya Lin