Patents Assigned to NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCCE AND TECHNOLOGY
  • Publication number: 20110291158
    Abstract: The present invention provides a HPT having high sensitivity and extensive wavelength band characteristics. The collector and barrier layer (5) is formed on the photo-absorption layer (6), wherein the energy level in the conduction band is higher than that of the photo-absorption layer (6), the energy level in the valence band is almost equal to or higher than that of the photo-absorption layer (6) and is a relatively wider gap semiconductor than the photo-absorption layer. The base layer (4) formed on the collector and barrier layer (5), is a relatively narrow gap as compared with the collector and barrier layer (5), wherein the energy level in the conduction band is equal to or higher than that of the collector and barrier layer (5) in the boundary of the collector and barrier layer (5).
    Type: Application
    Filed: February 12, 2010
    Publication date: December 1, 2011
    Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCCE AND TECHNOLOGY
    Inventors: Mutsuo Ogura, SungWoo Choi, Nobuyuki Hayama, Katsuhiko Nishida