Abstract: A GaN-based heterostructure field effect transistor capable of accomplishing higher output, higher breakdown voltage, higher speed, higher frequency, and the like. A heterostructure field effect transistor including a channel layer (4) of GaN and a barrier layer (6) of AlGaN, wherein the surface of a transistor element has an insulating film (10).
Type:
Application
Filed:
August 26, 2005
Publication date:
December 27, 2007
Applicant:
National Institute of Information and Communications Technology, Incorporated Adm