Abstract: The variability of an etchant concentration in an immersion processes for treatment of semiconductor devices can be significantly lowered by continuously measuring the conductivity of an etchant solution and comparing against predetermined thresholds. The etchant concentration can be maintained by a feed and bleed process based on conductivity measurements of the etchant solution and the conductivity measurements being correlated with premeasured pH values of an etchant solution.

Abstract: A system, apparatus, and method for processing substrates using acoustic energy. In one aspect, the invention can be a system for processing flat articles including a support for supporting the flat article and an acoustic energy treatment apparatus. The acoustic energy treatment apparatus may include a support arm and a plurality of transducer assemblies coupled thereto. The transducer assemblies may include a housing with a transducer coupled thereto, and the housings of the transducer assemblies may be arranged in an end-to-end manner. A trough may also be included that extends along at least a portion of a length of the transducer assemblies. The trough may serve as a reservoir that upon being filled and overflowed with a liquid allows the liquid to fluidly couple the transducer assemblies to the flat article.

Abstract: The variability of an etchant concentration in an immersion processes for treatment of semiconductor devices can be significantly lowered by continuously measuring the conductivity of an etchant solution and comparing against predetermined thresholds. The etchant concentration can be maintained by a feed and bleed process based on conductivity measurements of the etchant solution and the conductivity measurements being correlated with premeasured pH values of an etchant solution.