Patents Assigned to NBD NANOTECHNOLOGIES, INC.
  • Patent number: 10584137
    Abstract: The present disclosure relates, in exemplary embodiments, to compositions of matter comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures. The present disclosure also relates, in exemplary embodiments, to methods of making such synthetic blends.
    Type: Grant
    Filed: February 18, 2019
    Date of Patent: March 10, 2020
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventor: John Charles Warner
  • Patent number: 10450481
    Abstract: A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH—POSS) nanoparticles.
    Type: Grant
    Filed: June 6, 2017
    Date of Patent: October 22, 2019
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventors: Miguel Galvez, Bong June Zhang, Esra Altinok
  • Patent number: 10450469
    Abstract: The present disclosure relates, in exemplary embodiments, to processes for preparing omniphobic coatings on a substrate. The disclosure further relates to substrates comprising an omniphobic coating comprising a fluoride ion encapsulated F-POSS.
    Type: Grant
    Filed: June 9, 2016
    Date of Patent: October 22, 2019
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventor: Bong June Zhang
  • Patent number: 10442823
    Abstract: Functionalized F-POSS compounds comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures and/or functional groups.
    Type: Grant
    Filed: September 14, 2017
    Date of Patent: October 15, 2019
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventors: John C. Warner, Jean R. Loebelenz, Srinivasa Rao Cheruku, Thomas Woodrow Gero, Perry L. Catchings, Sr.
  • Patent number: 10392409
    Abstract: Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: August 27, 2019
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventors: Cheng Diao, Esra Altinok, Bong June Zhang, Perry L. Catchings, Sr.
  • Patent number: 10233336
    Abstract: Processes for preparing oleophobic and hydrophobic coatings on a substrate. More particularly, the disclosure relates to omniphobic surface treatment of substrates such as glass, ceramic, glass-ceramic, and the like.
    Type: Grant
    Filed: November 16, 2016
    Date of Patent: March 19, 2019
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventor: Bong June Zhang
  • Patent number: 10208070
    Abstract: The present disclosure relates, in exemplary embodiments, to compositions of matter comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures. The present disclosure also relates, in exemplary embodiments, to methods of making such synthetic blends.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: February 19, 2019
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventor: John Charles Warner
  • Patent number: 10174059
    Abstract: Functionalized F-POSS compounds comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures and/or functional groups.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: January 8, 2019
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventors: John C. Warner, Jean R. Loebelenz, Srinivasa Rao Cheruku, Thomas Woodrow Gero
  • Patent number: 9879151
    Abstract: Fluorinated polyhedral oligomeric silsesquioxane (“F-POSS”) copolymers and terpolymers useful in the field of coatings for enhancing performance of materials surfaces. Also disclosed are methods for making such copolymers and terpolymers.
    Type: Grant
    Filed: September 24, 2015
    Date of Patent: January 30, 2018
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventors: Perry L. Catchings, Sr., Bong June Zhang
  • Patent number: 9630981
    Abstract: The present disclosure relates to compositions of matter comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane compounds. The present disclosure also relates to methods of making such fluorinated polyhedral oligomeric silsesquioxane compounds from such synthetic blends. The present disclosure also relates to uses of such fluorinated polyhedral oligomeric silsesquioxane compounds.
    Type: Grant
    Filed: February 19, 2016
    Date of Patent: April 25, 2017
    Assignee: NBD Nanotechnologies, Inc.
    Inventors: John C. Warner, Jean R. Loebelenz, Srinivasa Rao Cheruku, Thomas Woodrow Gero
  • Patent number: 9409933
    Abstract: The present disclosure relates, in exemplary embodiments, to compositions of matter comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures. The present disclosure also relates, in exemplary embodiments, to methods of making such synthetic blends.
    Type: Grant
    Filed: October 7, 2015
    Date of Patent: August 9, 2016
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventor: John Charles Warner