Patents Assigned to NBD NANOTECHNOLOGIES, INC.
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Patent number: 11702433Abstract: Functionalized F-POSS compounds comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures and/or functional groups.Type: GrantFiled: October 14, 2019Date of Patent: July 18, 2023Assignee: NBD NANOTECHNOLOGIES, INC.Inventors: John C. Warner, Jean R. Loebelenz, Srinivasa Rao Cheruku, Thomas Woodrow Gero, Perry L. Catchings, Sr.
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Patent number: 11643570Abstract: A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH-POSS) nanoparticles.Type: GrantFiled: October 21, 2019Date of Patent: May 9, 2023Assignee: NBD NANOTECHNOLOGIES, INC.Inventors: Miguel Galvez, Bong June Zhang, Esra Altinok
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Patent number: 11066560Abstract: Processes for preparing oleophobic and hydrophobic coatings on a substrate. More particularly, the disclosure relates to omniphobic surface treatment of substrates such as glass, ceramic, glass-ceramic, and the like.Type: GrantFiled: March 15, 2019Date of Patent: July 20, 2021Assignee: NBD NANOTECHNOLOGIES, INC.Inventor: Bong June Zhang
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Patent number: 11008350Abstract: Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.Type: GrantFiled: August 26, 2019Date of Patent: May 18, 2021Assignee: NBD NANOTECHNOLOGIES, INC.Inventors: Cheng Diao, Esra Altinok, Bong June Zhang, Perry L. Catchings, Sr.
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Patent number: 10921072Abstract: Coatings for enhancing performance of materials surfaces, methods of producing the coating and coated substrates, and coated condensers are disclosed herein. More particularly, exemplary embodiments provide chemical coating materials useful for coating condenser components.Type: GrantFiled: December 29, 2016Date of Patent: February 16, 2021Assignee: NBD NANOTECHNOLOGIES, INC.Inventor: Bong June Zhang
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Patent number: 10584137Abstract: The present disclosure relates, in exemplary embodiments, to compositions of matter comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures. The present disclosure also relates, in exemplary embodiments, to methods of making such synthetic blends.Type: GrantFiled: February 18, 2019Date of Patent: March 10, 2020Assignee: NBD NANOTECHNOLOGIES, INC.Inventor: John Charles Warner
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Patent number: 10450481Abstract: A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH—POSS) nanoparticles.Type: GrantFiled: June 6, 2017Date of Patent: October 22, 2019Assignee: NBD NANOTECHNOLOGIES, INC.Inventors: Miguel Galvez, Bong June Zhang, Esra Altinok
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Patent number: 10450469Abstract: The present disclosure relates, in exemplary embodiments, to processes for preparing omniphobic coatings on a substrate. The disclosure further relates to substrates comprising an omniphobic coating comprising a fluoride ion encapsulated F-POSS.Type: GrantFiled: June 9, 2016Date of Patent: October 22, 2019Assignee: NBD NANOTECHNOLOGIES, INC.Inventor: Bong June Zhang
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Patent number: 10442823Abstract: Functionalized F-POSS compounds comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures and/or functional groups.Type: GrantFiled: September 14, 2017Date of Patent: October 15, 2019Assignee: NBD NANOTECHNOLOGIES, INC.Inventors: John C. Warner, Jean R. Loebelenz, Srinivasa Rao Cheruku, Thomas Woodrow Gero, Perry L. Catchings, Sr.
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Patent number: 10392409Abstract: Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.Type: GrantFiled: March 28, 2017Date of Patent: August 27, 2019Assignee: NBD NANOTECHNOLOGIES, INC.Inventors: Cheng Diao, Esra Altinok, Bong June Zhang, Perry L. Catchings, Sr.
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Patent number: 10233336Abstract: Processes for preparing oleophobic and hydrophobic coatings on a substrate. More particularly, the disclosure relates to omniphobic surface treatment of substrates such as glass, ceramic, glass-ceramic, and the like.Type: GrantFiled: November 16, 2016Date of Patent: March 19, 2019Assignee: NBD NANOTECHNOLOGIES, INC.Inventor: Bong June Zhang
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Patent number: 10208070Abstract: The present disclosure relates, in exemplary embodiments, to compositions of matter comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures. The present disclosure also relates, in exemplary embodiments, to methods of making such synthetic blends.Type: GrantFiled: August 8, 2016Date of Patent: February 19, 2019Assignee: NBD NANOTECHNOLOGIES, INC.Inventor: John Charles Warner
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Patent number: 10174059Abstract: Functionalized F-POSS compounds comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures and/or functional groups.Type: GrantFiled: March 9, 2016Date of Patent: January 8, 2019Assignee: NBD NANOTECHNOLOGIES, INC.Inventors: John C. Warner, Jean R. Loebelenz, Srinivasa Rao Cheruku, Thomas Woodrow Gero
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Patent number: 9879151Abstract: Fluorinated polyhedral oligomeric silsesquioxane (“F-POSS”) copolymers and terpolymers useful in the field of coatings for enhancing performance of materials surfaces. Also disclosed are methods for making such copolymers and terpolymers.Type: GrantFiled: September 24, 2015Date of Patent: January 30, 2018Assignee: NBD NANOTECHNOLOGIES, INC.Inventors: Perry L. Catchings, Sr., Bong June Zhang
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Patent number: 9409933Abstract: The present disclosure relates, in exemplary embodiments, to compositions of matter comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures. The present disclosure also relates, in exemplary embodiments, to methods of making such synthetic blends.Type: GrantFiled: October 7, 2015Date of Patent: August 9, 2016Assignee: NBD NANOTECHNOLOGIES, INC.Inventor: John Charles Warner